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机译:电化学刻蚀法制备多孔氧化锌的光学和结构性质
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia,Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Nano-Optoelectronics Research and Technology Laboratory, School of Physics. Universiti Sains Malaysia, 11800 Penang, Malaysia;
Metal oxide; Porous; Infrared reflectance;
机译:在通过电化学和光电化学蚀刻相结合的多孔GaN模板上生长的GaN膜和GaN / InGaN发光二极管的电学和结构特性
机译:在通过电化学和光电化学蚀刻相结合的多孔GaN模板上生长的GaN膜和GaN / InGaN发光二极管的电学和结构特性
机译:合金化对旋涂和退火方法制备的纳米晶铜锌氧化物薄膜的结构和光学性能的影响
机译:一种偏见持续时间对MSM光电探测器的新两步交流光辅助电化学蚀刻(ACPEC)技术制造的多孔Si结构性能的影响
机译:使用纳米技术的氧化物和氧化铟锌薄膜的氧化物和氮化物的光学,结构,电和磁性的工程
机译:氟化铵金属辅助化学刻蚀制备硅纳米线阵列的结构和光学性质
机译:硝酸浓度对多孔氧化锌薄膜刻蚀工艺,结构和光学性能的影响