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Nitrogen doped p-type SnO thin films deposited via sputtering

机译：通过溅射沉积氮掺杂的p型SnO薄膜

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摘要

p-Type SnO thin films were fabricated via reactive RF magnetron sputtering on borosilicate substrates with an Sn target and Ar/O_2/N_2 gas mixture. The undoped SnO thin film consisted of a polycrystalline SnO phase with a preferred (101) orientation; however, with nitrogen doping, the preferred orientation was suppressed and the grain size decreased. The electrical conductivity of the undoped SnO thin films demonstrated a relatively low p-type conductivity of 0.05 Ω~(-1) cm~(-1) and it was lowered slightly with nitrogen doping to 0.039 Ω~(-1) cm~(-1). The results of the X-ray photoelectron spectroscopy suggested that the nitrogen doping created donor defects in the SnO thin films causing lower electrical conductivity. Lastly, both the undoped and doped SnO thin films had poor optical transmittance in the visible range.
机译：通过反应射频磁控溅射在具有Sn靶和Ar / O_2 / N_2混合气体的硼硅酸盐衬底上制备p型SnO薄膜。未掺杂的SnO薄膜由具有优选（101）取向的多晶SnO相组成。然而，通过氮掺杂，优选的取向被抑制并且晶粒尺寸减小。未掺杂的SnO薄膜的电导率显示出相对较低的p型电导率，为0.05Ω〜（-1）cm〜（-1），氮掺杂后略微降低至0.039Ω〜（-1）cm〜（ -1）。 X射线光电子能谱的结果表明，氮掺杂在SnO薄膜中产生了供体缺陷，从而导致较低的电导率。最后，未掺杂和掺杂的SnO薄膜在可见光范围内的透光率均较差。

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  • 来源
    《Materials Science and Engineering》 |2012年第16期|p.1470-1475|共6页
  • 作者

    Y. Kim; J.H. Jang; J.S. Kim; S.D. Kim; S.E. Kim;

  • 作者单位

    Microsystems Packaging Center, Seoul Technopark, 172 Gongreung 2dong, Nowongu. Seoul 139-743, Republic of Korea;

    Manufacturing System & Design Engineering, Seoul National University of Science and Technology, 172 Gongreung 2dong, Nowongu, Seoul 139-743, Republic of Korea;

    Product Design and Manufacturing Engineering, Seoul National University of Science and Technology, 172 Gongreung 2dong, Nowongu, Seoul 139-743, Republic of Korea;

    School of Mechanical Design and Automation Engineering, Seoul National University of Science and Technology, 172 Gongreung 2dong, Nowongu, Seoul 139-743, Republic of Korea;

    Graduate School of NID Fusion Technology, Seoul National University of Science and Technology, 172 Gongreung 2dong, Nowongu, Seoul 139-743, Republic of Korea;

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  • 正文语种 eng
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  • 关键词

    tin oxide; sputtering; nitrogen;

    机译：氧化锡溅射氮;

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