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首页> 外文期刊>Materials Science and Engineering >Study of (100) orientated ZnO films by APCVD system
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Study of (100) orientated ZnO films by APCVD system

机译：APCVD系统研究（100）取向ZnO薄膜

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摘要

ZnO thin films were grown on glass substrate by Atmospheric Pressure Chemical Vapor Deposition system (APCVD), using zinc acetate (Zn(CH_3COO)_2) as precursor of Zn. The solution was prepared with zinc acetate in ammonium hydroxide (NH_4OH). Ozone was used as an oxidant agent to obtain ZnO films. The aqueous solution of zinc acetate was bubbled with nitrogen flow into the reaction chamber. The structural and optical properties of ZnO films were investigated in different deposition temperatures (300-375℃ in steps of 25℃). X-ray diffraction results show that all deposited films were polycrystallined in (100) preferred orientation. Our samples showed a transmittance bigger or similar to 80% in the visible region. Preliminary studies show that the room-temperature photoluminescence spectrum of all films exhibits a strong peak in visible region at 492.31 nm.
机译：使用大气压化学气相沉积系统（APCVD）在玻璃基板上生长ZnO薄膜，使用乙酸锌（Zn（CH_3COO）_2）作为Zn的前体。用乙酸锌的氢氧化铵溶液（NH_4OH）制备溶液。使用臭氧作为氧化剂来获得ZnO膜。将乙酸锌的水溶液用氮气流鼓泡到反应室中。在不同的沉积温度（300-375℃，以25℃为步长）下研究了ZnO薄膜的结构和光学性能。 X射线衍射结果表明，所有沉积的膜都以（100）优选取向多晶。我们的样品显示出在可见光区域的透射率大于或等于80％。初步研究表明，所有薄膜的室温光致发光光谱在可见光区域的492.31 nm处均显示出很强的峰。

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  • 来源
    《Materials Science and Engineering》 |2010年第3期|p.38-41|共4页
  • 作者

    M. Pacio; H.Juarez; G. Escalante; G. Garcia; T. Diaz; E. Rosendo;

  • 作者单位

    Centra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

    rnCentra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

    rnCentra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

    rnCentra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

    rnCentra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

    rnCentra de Investigation en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur and Av. San Claudio, San Manuel 72000, Puebla, Mexico;

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  • 正文语种 eng
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  • 关键词

    chemical vapor deposition; film deposition; ozone; thin films; zinc oxide;

    机译：化学气相沉积;薄膜沉积;臭氧;薄膜;氧化锌;

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