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机译:晶格匹配缓冲层ScAlMgO_4上的GaN外延膜的大畴生长
Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Graduate School of Engineering, Nagoya University, Furo, Chikusa-ku, Nagoya 464-8603, Japan;
Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;
gallium nitride; epitaxial growth; lattice-matched buffer layer; homologous series compound; reactive-solid phase epitaxy (R-SPE); molecular beam epitaxy (MBE);
机译:ScGaO_3(ZnO)_m缓冲层制备ScAlMgO_4外延薄膜及其在ZnO外延生长的晶格匹配缓冲层中的应用
机译:晶格匹配ScAlMgO_4(0 0 0 1)衬底上ZnO薄膜的外延生长
机译:晶格匹配的ScAlMgO_4(0001)衬底上ZnO薄膜的外延生长
机译:新的缓冲层技术,使用底层外延A1N薄膜进行高质量GaN生长
机译:通过异质外延GaN薄膜中的缓冲层控制应力和缺陷
机译:接近无应变的GaN兼容缓冲层上GaN外延层中的超低穿线位错密度及其在异质外延LED中的应用
机译:勘误:“使用低温生长技术在近晶格匹配的铪基板上外延生长GaN薄膜”[apL mater。 4,076104(2016)]