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Large domain growth of GaN epitaxial films on lattice-matched buffer layer ScAlMgO_4

机译:晶格匹配缓冲层ScAlMgO_4上的GaN外延膜的大畴生长

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摘要

A homologous series compound ScAlO_3(MgO) (SCAM) has a superior lattice matching as small as ~1.4% in a-axis with GaN. This paper reports an efficient fabrication process of a single-crystalline SCAM buffer layer on a (111) yttria-stabilized zirconia (YSZ) substrate using pulsed laser deposition (PLD). A 10-nm thick ZnO epitaxial layer was used to induce solid-phase epitaxial growth of an amorphous (a-) SCAM layer formed at room temperature on (111) YSZ. It was found that the addition of excess Sc_2O_3 and ZnO to a SCAM target used for PLD was needed to obtain single-crystalline SCAM films with atomically flat terraces-and-steps surfaces. The resulting single-crystal line SCAM films were examined as buffer layers to grow GaN by molecular beam epitaxy with a plasma nitrogen source. The GaN films were grown epitaxially on the SCAM/YSZ substrates with the epitaxial relationship of [0001]GaN||[0001]SCAM||[111]YSZand [100] GaN||[11-20] SCAM||[1-10] YSZ. The SCAM buffer layers enhanced lateral growth of the GaN films owing to the good lattice matching.
机译:同源系列化合物ScAlO_3(MgO)(SCAM)与GaN在a轴上的晶格匹配度低至约1.4%。本文报道了使用脉冲激光沉积(PLD)在(111)氧化钇稳定的氧化锆(YSZ)衬底上的单晶SCAM缓冲层的高效制造工艺。使用10 nm厚的ZnO外延层诱导在室温下在(111)YSZ上形成的非晶(a-)SCAM层的固相外延生长。已发现,需要向用于PLD的SCAM靶中添加过量的Sc_2O_3和ZnO才能获得具有原子平坦的梯阶表面的单晶SCAM膜。检查所得的单晶线SCAM膜作为缓冲层,以通过等离子体氮源通过分子束外延生长GaN。在SCAM / YSZ衬底上外延生长具有[0001] GaN || [0001] SCAM || [111] YSZ和[100] GaN || [11-20] SCAM || [1-]的外延关系的GaN膜。 10] YSZ。由于良好的晶格匹配,SCAM缓冲层增强了GaN膜的横向生长。

著录项

  • 来源
    《Materials Science and Engineering》 |2009年第3期|66-70|共5页
  • 作者单位

    Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Graduate School of Engineering, Nagoya University, Furo, Chikusa-ku, Nagoya 464-8603, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology. 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan ERATO-SORST, JST. in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

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  • 正文语种 eng
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  • 关键词

    gallium nitride; epitaxial growth; lattice-matched buffer layer; homologous series compound; reactive-solid phase epitaxy (R-SPE); molecular beam epitaxy (MBE);

    机译:氮化镓外延生长晶格匹配的缓冲层;同源系列化合物反应固相外延(R-SPE);分子束外延(MBE);

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