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Ir/Ag reflector for high-performance GaN-based near UV light emitting diodes

机译:Ir / Ag反射器,用于基于GaN的高性能近紫外发光二极管

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We report on the formation of reflective and low resistance Ag-based contacts to p-GaN using Ir interlayers for GaN-based near UV flip-chip light emitting diodes (FCLEDs). The as-deposited Ir/Ag contacts give non-linear current-voltage (Ⅰ-Ⅴ) behaviors. However, the contacts become ohmic with specific contact resistance of ~10~(-4) Ω cm~2 when annealed at temperatures 330-530℃ for 1 min in air. The 530℃-annealed Ir/Ag contacts give a reflectance of ~75% at a wavelength of 405 nm, which is somewhat higher than that (~71%) of annealed single Ag contacts. It is also shown that the output power of the LEDs made with the annealed Ir/Ag contact is higher than that with the annealed single Ag contact.
机译:我们报道了使用Ir中间层形成基于GaN的近紫外倒装芯片发光二极管(FCLED)的p-GaN的反射和低电阻基于Ag的触点。沉积的Ir / Ag触点具有非线性电流-电压(Ⅰ-Ⅴ)行为。然而,在空气中于330-530℃下退火1分钟后,该接触点变为欧姆,比电阻为〜10〜(-4)Ωcm〜2。 530℃退火的Ir / Ag触点在405 nm波长下的反射率为〜75%,比退火的单个Ag触点的反射率(〜71%)要高一些。还显示出,经退火的Ir / Ag触点制成的LED的输出功率高于经退火的单个Ag触点制成的LED的输出功率。

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