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Preparation of ZnS thin films by the pulsed electrochemical deposition

机译:脉冲电化学沉积制备ZnS薄膜

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摘要

We deposited ZnS thin films on Sn-doped In_2O_3-coated glass substrate using normal and pulsed electrochemical deposition (ECD) from aqueous solutions containing Na_2S_2O_3 and ZnSO_4 with two different compositions. Generally, the films deposited using pulsed deposition has much better surface morphology and optical properties than those deposited by normal ECD. The film deposited from the ZnSO_4-rich solution was of stoichiometric composition and after 300℃ annealing gives high transparency.
机译:我们使用包含两种不同成分的Na_2S_2O_3和ZnSO_4的水溶液进行常规和脉冲电化学沉积(ECD),在掺Sn In_2O_3涂层的玻璃基板上沉积ZnS薄膜。通常,使用脉冲沉积法沉积的薄膜比常规ECD沉积的薄膜具有更好的表面形态和光学性能。从富含ZnSO_4的溶液中沉积的膜具有化学计量组成,并且在300℃退火后具有很高的透明度。

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