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Nitrogen functionalization of MWCNTs in Ar-N_2 dielectric barrier discharge - Gas ratio effect

机译:AR-N_2介电阻挡放电 - 气体比效应MWCNT的氮官能化

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摘要

In this work, the effect Ar-N_2 mixture plasma on the surface characters and structure of MWCNTs were investigated. The plasma treatment was performed at various nitrogen gas ratio, while RF power, treatment time and gas pressure were kept fixed. The plasma species were monitored with optical emission spectroscopy. The X-ray photoelectron spectroscopy (XPS) confirmed the formation of nitrogen functional groups on the plasma-treated MWCNTs outer surface and its concentrations are dependent on the nitrogen gas ratio in the mixture plasma. The Raman analysis results are consistent with XPS observation. The MWCNTs surface roughness is enhanced as nitrogen gas ratio is increased in the plasma as observed by TEM and XPS images. The MWCNTs structure was not damaged as observed by XRD pattern. The correlations between the relative intensities of Ar-N_2 plasma species and the surface characters of the MWCNTs are also investigated.
机译:在这项工作中,研究了效果Ar-N_2混合物血浆对MWCNT的表面特征和结构进行了研究。以各种氮气比进行等离子体处理,而RF功率,处理时间和气体压力保持固定。用光发射光谱监测等离子体物种。 X射线光电子能谱(XPS)证实了在等离子体处理的MWCNT外表道上形成氮官能团,其浓度取决于混合物等离子体中的氮气比。拉曼分析结果与XPS观察一致。随着TEM和XPS图像观察到的等离子体中,MWCNTS表面粗糙度增强,因为氮气比在等离子体中增加。 MWCNTS结构未被XRD图案观察到损坏。还研究了Ar-N_2等离子体物质的相对强度与MWCNT的表面特征之间的相关性。

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  • 来源
    《Materials Science and Engineering》 |2020年第11期|114680.1-114680.7|共7页
  • 作者单位

    Physics Department College of Science and Humanities Prince Sattam Bin Abdulaziz University P.O. 173 Al-Kharj 11942 Saudi Arabia Physics Department Faculty of Science Zagazig University Zagazig 44519 Egypt;

    Department of Electrical and Electronic Engineering Chubu University 1200 Matsumoto-cho Kasugai 487-8501 Japan;

    Department of Electrical and Electronic Engineering Chubu University 1200 Matsumoto-cho Kasugai 487-8501 Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    MWCNT; Dielectric-Barier discharge; XPS; TEM; Raman; XRD;

    机译:mwcnt;介电阻挡放电;XPS;TEM;拉曼;XRD.;

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