...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Microelectronic Engineering >Control of sonoluminescence signal in deionized water using carbon dioxide
【24h】

Control of sonoluminescence signal in deionized water using carbon dioxide

机译：用二氧化碳控制去离子水中的声致发光信号

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Megasonic cleaning is routinely employed in semiconductor industry for cleaning of wafers. However, the method also results in damage to wafer features and such damage has been proposed to arise from transient, imploding cavities formed during megasonic processing. Transient cavitation is associated with the release of light, a phenomenon called sonoluminescence (SL) and the extent of damage has been shown to correlate with the intensity of SL Control of sonoluminescence may therefore allow control of damage during megasonic processing of wafers. In this study, the ability of carbon dioxide to quench sonoluminescence generation in deionized water exposed to megasonic field of varying power density and duty cycle has been systematically investigated. It has been found that CO_2 is not only incapable but also a potent inhibitor of sonoluminescence, providing a potential means for selective alleviation of the violent effects of transient cavitation in process fluids. A novel chemical method has been established for in situ release of CO_2 from NH4HCO_3 through a pH induced shift in the carbonic acid equilibria in deionized water. Using this method, a precisely controlled, progressive decrease in SL of air saturated deionized water through addition of NH4HCO_3 has been demonstrated. It has been determined that 130 ppm of released CO_2 is sufficient for complete inhibition of sonoluminescence generated in air saturated deionized water.
机译：在半导体工业中，兆声波清洗通常用于清洗晶片。然而，该方法也导致晶片特征的损坏，并且已经提出这种损坏是由于在超音速处理期间形成的瞬时的，内爆的腔而引起的。瞬态空化与光的释放有关，这种现象称为声致发光（SL），并且损坏程度已与SL的强度相关联。因此，控制声致发光可在晶片的超声波处理过程中控制损坏。在这项研究中，已经系统地研究了二氧化碳在去离子水中的能力，该去离子水中暴露于变化的功率密度和占空比的兆超声场中。已经发现，CO 2不仅不能，而且是声致发光的有效抑制剂，为选择性减轻工艺流体中瞬时空化的剧烈作用提供了潜在的手段。已经建立了一种新的化学方法，该方法可通过pH引起的去离子水中碳酸平衡的转变，从NH4HCO_3原位释放CO_2。使用这种方法，已证明通过添加NH4HCO_3可以精确控制，逐步降低空气饱和去离子水的SL。已经确定130ppm的释放的CO 2足以完全抑制在空气饱和的去离子水中产生的声致发光。

著录项

  • 来源
    《Microelectronic Engineering》 |2011年第12期|p.3437-3441|共5页
  • 作者

    S. Kumari; M. Keswani; S. Singh; M. Beck; E. Liebscher; P. Deymier; S. Raghavan;

  • 作者单位

    Department of Materials Science and Engineering, The University of Arizona, Tucson, AZ 85721, USA;

    Department of Materials Science and Engineering, The University of Arizona, Tucson, AZ 85721, USA;

    Department of Chemistry and Biochemistry, The University of Arizona, Tucson, AZ 85721, USA;

    Product Systems incorporation, Campbell, CA 95008, USA;

    Product Systems incorporation, Campbell, CA 95008, USA;

    Department of Materials Science and Engineering, The University of Arizona, Tucson, AZ 85721, USA;

    Department of Materials Science and Engineering, The University of Arizona, Tucson, AZ 85721, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    megasonic cleaning; wafer damage; sonoluminescence; carbon dioxide; acoustic cavitation; cavitation threshold;

    机译：超声波清洗;晶圆损坏;声致发光二氧化碳;声空化空化阈值;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号