Study of interaction between silicon surfaces in dilute ammonia peroxide mixtures (APM) and their components using atomic force microscope (AFM)

著录项

• 来源
  《Microelectronic Engineering》 |2011年第12期|p.3442-3447|共6页
• 作者

  S. Siddiqui; J. Zhang; M. Keswani; A. Fuerst; S. Raghavan;

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• 作者单位

  Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721, USA;

  Department of Mining and Geological Engineering, University of Arizona, Tucson, AZ 85721, USA;

  Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721, USA;

  Intel Corporation, Rio Rancho, NM 87124, USA;

  Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721, USA;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  wafer cleaning; ammonia-hydrogen peroxide (APM); mixtures; interaction forces; contact angle measurements and atomic; force microscopy (AFM);

  机译：晶圆清洗;氨过氧化氢（APM）;混合物相互作用力接触角测量和原子;力显微镜（AFM）;