Fabrication and measurement of large-area sub-wavelength structures with broadband and wide-angle antireflection effect

著录项

• 来源
  《Microelectronic Engineering》 |2010年第8期|1323-1327|共5页
• 作者

  Yung-Pin Chen; Hsin-Chieh Chiu; Guan-Yu Chen; Chieh-Hsiu Chiang; Ching-Tung Tseng; Chih-Hsien Lee; Lon A. Wang;

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• 作者单位

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

  Photonics and Nano-Structure Lab., Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University,Taipei 10617, Taiwan;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  antireflection; sub-wavelength structures; interference lithography; varied-angle reflectometer;

  机译：防反射亚波长结构;干涉光刻;变角反射仪;