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Analysis of intermittent timing fault vulnerability

机译:间歇性定时故障脆弱性分析

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摘要

Continuous scaling of transistor feature size rapidly increases the effect of intermittent faults. These faults manifest as timing violations due to the combined effects of process variation, circuit wear-out, and variation in environmental conditions. In this paper, we combine all critical sources of intermittent faults in a comprehensive framework. Our experiments with the MIPS-789 processor reveal that at the 22nm technology node, the combined effect of all the factors can degrade the delay by 2.5X. Such gross delay degradation extending more than two cycles can render many recently proposed time borrowing techniques ineffective. We analyze three architectural techniques to mitigate intermittent faults and evaluate them using full system architectural simulation.
机译:晶体管特征尺寸的连续缩放迅速增加了间歇性故障的影响。由于过程变化,电路磨损和环境条件变化的综合影响,这些故障表现为时序违规。在本文中,我们在一个综合的框架中结合了所有间歇性故障的关键来源。我们使用MIPS-789处理器进行的实验表明,在22纳米技术节点上,所有因素的综合作用可使延迟降低2.5倍。这样的总延迟降级超过两个周期,可能会使许多最近提出的时间借用技术失效。我们分析了减轻间歇性故障的三种架构技术,并使用完整的系统架构仿真对其进行了评估。

著录项

  • 来源
    《Microelectronics & Reliability》 |2012年第7期|p.1515-1522|共8页
  • 作者单位

    Electrical and Computer Engineering, Utah State University, 4120 Old Main Hill, Logan UT 84322, United States;

    Electrical and Computer Engineering, Utah State University, 4120 Old Main Hill, Logan UT 84322, United States;

    Electrical and Computer Engineering, Utah State University, 4120 Old Main Hill, Logan UT 84322, United States;

    Electrical and Computer Engineering, Utah State University, 4120 Old Main Hill, Logan UT 84322, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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