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Spherical aberration correction in aplanatic solid immersion lens imaging using a MEMS deformable mirror

机译:使用MEMS变形镜在平面固体浸没透镜成像中进行球差校正

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摘要

Aplanatic solid immersion lens (S1L) microscopy is required to achieve the highest possible resolution for next generation silicon IC backside inspection and failure analysis. However, aplanatic SILs are very susceptible to spherical aberrations introduced by substrate thickness mismatch. We correct this aberration using a MEMS deformable mirror. Good agreement between theory and experiment is achieved and spot intensity increases by a factor of two to three are demonstrated.
机译:为了实现下一代硅IC背面检查和故障分析的最大可能分辨率,需要使用平面固体浸没透镜(S1L)显微镜。但是,非平面SIL极易受到基材厚度不匹配引起的球差的影响。我们使用MEMS变形镜校正了这种像差。理论与实验之间达到了良好的一致性,并且光斑强度增加了2到3倍。

著录项

  • 来源
    《Microelectronics & Reliability》 |2012年第10期|p.2120-2122|共3页
  • 作者单位

    Department of Mechanical Engineering, Boston University, Boston, MA, USA;

    Department of Physics, Boston University, Boston, MA USA;

    Department of Mechanical Engineering, Boston University, Boston, MA, USA;

    Department of Materials Science and Engineering, Boston, University, Boston, MA, USA;

    Department of Electrical and Computer Engineering, Boston, University, Boston, MA, USA;

    Department of Mechanical Engineering, Boston University, Boston, MA, USA,Centers for Nanoscience and Photonics, Boston University, Boston, MA USA;

    Department of Electrical and Computer Engineering, Boston, University, Boston, MA, USA,Centers for Nanoscience and Photonics, Boston University, Boston, MA USA;

    Department of Physics, Boston University, Boston, MA USA,Centers for Nanoscience and Photonics, Boston University, Boston, MA USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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