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Synthesis of cubic silicon nitride

机译:立方氮化硅的合成

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Silicon nitride (Si_3N_4) is used in a variety of important technological applications. The high fracture toughness, hardness and wear resistance of Si_3N_4-based ceramics are exploited in cutting tools and anti-friction bearings; in electronic applications, Si_3N_4 is used as an insulating, masking and passivating material. Two polymorphs of silicon nitride are known, both of hexagonal structure: α- and β-Si_3N_4. Here we report the synthesis of a third polymorph of silicon nitride, which has a cubic spinel structure. This new phase, c-Si_3N_4, is formed at pressures above 15 GPa and temperatures exceeding 2,000 K, yet persists metastably in air at ambient pressure to at least 700 K. First-principles calculations of the properties of this phase suggest that the hardness of c-Si_3N_4 should be comparable to that of the hardest known oxide (stishovite, a high-pressure phase of SiO_2), and significantly greater than the hardness of the two hexagonal polymorphs.
机译:氮化硅(Si_3N_4)被用于各种重要的技术应用中。 Si_3N_4基陶瓷的高断裂韧性,硬度和耐磨性被用于切削工具和减摩轴承中。在电子应用中,Si_3N_4用作绝缘,掩膜和钝化材料。已知氮化硅的两种多晶型物,均具有六边形结构:α-和β-Si_3N_4。在这里,我们报道了具有立方尖晶石结构的氮化硅的第三多晶型物的合成。这个新的相c-Si_3N_4是在高于15 GPa的压力和超过2,000 K的温度下形成的,但在空气中至少在700 K的环境压力下仍能稳定存在。该相的性质的第一性原理计算表明, c-Si_3N_4应该与已知最坚硬的氧化物(水辉石,SiO_2的高压相)相媲美,并且明显大于两个六边形多晶型物的硬度。

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