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机译:空位缺陷对单层二硒化钨光电性能的影响
School of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, People's Republic of China;
School of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, People's Republic of China;
School of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, People's Republic of China;
CT Department, Yan'an University Affiliated Hospital, Yan'an 716000, People's Republic of China;
College of Optoelectronics Technology, Chengdu University of Information Technology, Chengdu 610225, People's Republic of China;
School of Physics and Astronomy, Queen Mary University of London, London E1 4NS, UK;
School of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, People's Republic of China;
School of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, People's Republic of China;
Optoelectronic property; Vacancy defect; Tungsten diselenide;
机译:探索硅五硒甲基单层的运输和光电性能
机译:碳离子辐照对单层二硒化钨表面微观结构和光致发光性能的影响
机译:S空置工程化电子和光电性能的Ni掺杂MOS2单层:杂交功能研究
机译:氮化硼和单层或二层钨二硒化物组成的二维异质结构中密度依赖的激子性质和动力学
机译:二维钨酶朝向功能电子和光电器件的表面工程
机译:单层二硒钨的材料合成和器件方面
机译:衬底材料对光学性质的影响 钨二硒化物单层膜