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Dependence of femtosecond writing parameters in waveguide formation process within significantly broad depths range

机译:飞秒写入参数在波导形成过程中在相当宽的深度范围内的依赖性

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摘要

Direct femtosecond laser inscription has become an advanced and widespread maskless technology for waveguides writing inside optical materials. One of the advantages of the technology consists in combination of both high efficiency of integral optics and perfect thermal and spectral characteristics of bulk optical elements. In the paper we proposed, for what is believed to be the first time, femtosecond inscription of induced structures with modified refractive index (reduced down to -6 × 1(T~(-3)) within significantly broad depth range (more than 550 urn) and waveguide with mode field diameter 200 urn, 30 mm length and numerical aperture 0.04. Proposed result broadens field of application of femtosecond writing technology into large mode diameter waveguides formation and hybrid integral-bulk laser schemes that create an opportunity to develop novel optical elements. Laser induced tracks with controlled refractive index were written with aspherical lens at all the depths within range between 550 and 1100 um under the surface of the sample. Continuous writing process at significantly different depths was based on dynamic adjustment of femtosecond pulses energy to compensate negative effect of spherical aberration. In the investigation we examined dependences of writing energy range and geometry of induced refractive index tracks on writing depth. Experiments were carried out in Nd:phosphate glass in thermal cumulative regime (repetition rate of femtosecond pulses was 2 MHz) and compared with numerical simulation. It was shown, that dependence of working range on focusing depth is nonlinear, nonmonotonic and significantly differs for positive and negative shift from optimal correction depth of the lens.
机译:飞秒直接激光刻印已成为一种先进的且广泛使用的无掩模技术,用于在光学材料内部写入波导。该技术的优点之一是将集成光学器件的高效率与块状光学元件的完美热和光谱特性结合在一起。在我们的论文中,我们首次提出了在显着较宽的深度范围(大于550度)内具有改变的折射率(降低至-6×1(T〜(-3))的诱导结构的飞秒铭刻) urn)和模式场直径为200 urn,长度为30 mm,数值孔径为0.04的波导。拟议的结果扩大了飞秒写入技术在大模式直径波导形成和混合整体体激光方案中的应用范围,从而为开发新型光学器件提供了机会用非球面透镜在样品表面下550至1100 um范围内的所有深度上写入具有受控折射率的激光诱导轨迹,并根据飞秒脉冲能量的动态调节来补偿在不同深度下的连续写入过程球差的负面影响在研究中,我们研究了书写能量范围和感应几何形状的依赖性折射率随书写深度而变化。在Nd:磷酸盐玻璃中以热累积方式(飞秒脉冲的重复率为2 MHz)进行了实验,并与数值模拟进行了比较。结果表明,工作范围对聚焦深度的依赖性是非线性的,非单调的,并且相对于镜头的最佳校正深度而言,正向和负向偏移存在显着差异。

著录项

  • 来源
    《Optical and quantum electronics》 |2017年第1期|43.1-43.9|共9页
  • 作者单位

    Moscow Institute of Physics and Technology, 9 Institutskiy per., Dolgoprudny, Moscow Region,Russian Federation,Optosystems Ltd., Moscow, Russian Federation;

    Moscow Institute of Physics and Technology, 9 Institutskiy per., Dolgoprudny, Moscow Region,Russian Federation,Optosystems Ltd., Moscow, Russian Federation;

    Physics Instrumentation Center of the General Physics Institute, Moscow, Russia;

    Optosystems Ltd., Moscow, Russian Federation;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Waveguide; Integrated optics; Femtosecond writing; Refractive index;

    机译:波导;集成光学飞秒写作;折光率;

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