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首页> 外文期刊>Optical and quantum electronics >Analysis of the elliptic-profile cylindrical reflector with a non-uniform resistivity using the complex source and dual-series approach: H-polarization case
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Analysis of the elliptic-profile cylindrical reflector with a non-uniform resistivity using the complex source and dual-series approach: H-polarization case

机译：使用复数源和双序列方法分析具有非均匀电阻率的椭圆形圆柱反射器：H极化情况

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摘要

An elliptic-profile reflector with varying resistivity is analyzed under the illumination by an H-polarized beam generated by a complex-source-point (CSP) feed. The emphasis is done on the focusing ability that is potentially important in the applications in the optical range related to the partially transparent mirrors. We formulate the corresponding electromagnetic boundary-value problem and derive a singular integral equation from the resistive-surface boundary conditions. This equation is treated with the aid of the regu-larization technique called Riemann Hilbert Problem approach, which inverts the stronger singular part analytically, and converted to an infinite-matrix equation of the Fredholm 2nd kind. The resulting numerical algorithm has guaranteed convergence. This type of solution provides more accurate and faster results compared to the known method of moments. In the computations, a CSP feed is placed into a more distant geometrical focus of the elliptic reflector, and the near-field values at the closer focus are plotted and discussed. Various far-field radiation patterns including those for the non-uniform resistive variation on the reflector are also presented.
机译：在复杂的源点（CSP）馈电产生的H偏振光束照射下，分析了电阻率变化的椭圆形反射镜。重点放在聚焦能力上，该聚焦能力在与部分透明镜有关的光学范围内的应用中可能很重要。我们制定了相应的电磁边界值问题，并从电阻表面边界条件导出了奇异积分方程。该方程借助于称为Riemann Hilbert问题方法的常规化技术进行处理，该方法解析地转换了较强的奇异部分，并转换为Fredholm第二类无限矩阵方程。所得的数值算法具有保证的收敛性。与已知的矩量法相比，此类解决方案可提供更准确，更快的结果。在计算中，将CSP馈入放置在椭圆形反射镜的更远的几何焦点中，并绘制和讨论在更近焦点处的近场值。还介绍了各种远场辐射图，包括那些反射镜上电阻变化不均匀的辐射图。

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