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机译:不同后退火温度下F掺杂ZnO薄膜的光电性能
Department of Resources Engineering, National Cheng Kung University;
Department of Mechanical Engineering, National Kaohsiung University of Science and Technology;
Department of Electrical Engineering, Cheng Shiu University;
Department of Resources Engineering, National Cheng Kung University;
Department of Mechanical Engineering, National Kaohsiung University of Science and Technology;
TCO; FZO; RF sputtering; Annealing;
机译:后退火对掺铝ZnO薄膜结构,光学和电学性质的影响
机译:不同气氛后退火工艺的掺镓ZnO薄膜的光电性能
机译:2 wt。%Al_2O_3掺杂的ZnO薄膜的光电性能以及具有超薄栅极绝缘体的Al掺杂的ZnO薄膜晶体管的特性
机译:退火温度对N掺杂ZnO膜结构和电性能的影响
机译:掺钇的氧化oxide纳米晶体薄膜的结构,光学和电学性质。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:掺杂浓度和退火温度对溶胶 - 凝胶法对Ga掺杂ZnO薄膜电和光学性质的影响