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The optical and electrical properties of F doped ZnO thin film by different post-annealing temperatures

机译:不同后退火温度下F掺杂ZnO薄膜的光电性能

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摘要

Abstract The optical and electronic properties of thin films of FZO (F:ZnO = 2:98 at.%) after annealing at different temperature was investigated. The films used in this study were prepared by Radio Frequency Magnetron Sputtering (RF-sputtering) on Corning glass substrates. The results show that the FZO transparent conductive films made at a sputtering power of 50 W, in an Argon atmosphere 15 sccm, after 90 min of deposition at a pressure of 6 mtorr, annealed at 400 °C had the lowest electrical resistivity, and an average transmittance of 85.16% at 400 nm. XRD analysis revealed a peak of growth in the (002) direction which rose with annealing temperature indicating improved crystallinity.
机译:摘要研究了在不同温度下退火后FZO(F:ZnO = 2:98at。%)薄膜的光学和电子性能。本研究中使用的薄膜是通过在康宁玻璃基板上进行射频磁控溅射(RF溅射)制备的。结果表明,在氩气环境下,在50scW的溅射功率下,在16sccm的压力下沉积90分钟,在6mtorr的压力下沉积90分钟,然后在400°C退火的FZO透明导电膜具有最低的电阻率,并且在400nm处的平均透射率为85.16%。 XRD分析显示在(002)方向上的生长峰值,其随着退火温度升高而表明改善的结晶度。

著录项

  • 来源
    《Optical and quantum electronics》 |2018年第4期|169.1-169.8|共8页
  • 作者单位

    Department of Resources Engineering, National Cheng Kung University;

    Department of Mechanical Engineering, National Kaohsiung University of Science and Technology;

    Department of Electrical Engineering, Cheng Shiu University;

    Department of Resources Engineering, National Cheng Kung University;

    Department of Mechanical Engineering, National Kaohsiung University of Science and Technology;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TCO; FZO; RF sputtering; Annealing;

    机译:TCO;FZO;RF溅射;退火;

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