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Relation between carriers hopping rate and structural constants in amorphous carbon nickel films with different nickel nanoparticles distributions

机译：不同镍纳米粒子分布的无定形碳镍薄膜中载流子跳变率与结构常数之间的关系

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In this paper, the films were prepared by radio frequency magnetron co-sputtering technique. The effect of different mosaic targets made of nickel strips and graphite pure on the dielectric relaxation time, the carriers hopping rate, the fractal dimensions and the optical loss of films were studied. The values of the optical band gap of films using the cross-point between the tangent of the plot of lower and higher values of the photon energy were calculated. The films deposited at 4.64% have maximum hopping rate of about 8.6 x 10(12) S-1. It can be seen that the films deposited at 3.92% have minimum value of fractal dimension of 2.27. With increasing Ni content of films a nonmetal-metal transition is observed which it is explainable by the power law of percolation theory. Critical metal content and the critical exponent of films were 87.25% and 1, respectively. With increasing Ni content, the carriers effective mass of films decreased and average lattice separation values of films increased. Films deposited at 3.92% have minimum value of Debye frequency nu(D) of about 1.09 x 10(12) Hz. The value of energy loss by free charge carriers when traversing the bulk and surface of films at 3.92% has maximum value and it has an increasing function behavior with energy.
机译：本文采用射频磁控共溅射技术制备了薄膜。研究了由镍条和纯石墨制成的不同镶嵌靶材对介电弛豫时间，载流子跳跃率，分形维数和薄膜光学损耗的影响。使用较低和较高光子能量值的曲线的切线之间的交叉点，计算薄膜的光学带隙值。以4.64％沉积的薄膜的最大跳跃率约为8.6 x 10（12）S-1。可以看出，以3.92％沉积的膜的分形维数的最小值为2.27。随着膜中镍含量的增加，观察到非金属-金属的转变，这可以通过渗流理论的幂定律来解释。薄膜的临界金属含量和临界指数分别为87.25％和1。随着Ni含量的增加，薄膜的载流子有效质量降低，薄膜的平均晶格分离值增加。以3.92％沉积的薄膜的德拜频率nu（D）的最小值约为1.09 x 10（12）Hz。当自由电荷载流子以3.92％穿过薄膜的体积和表面时，其能量损失的值达到最大值，并且随着能量的增加其功能行为也随之增加。

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