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Multifractal and optical bandgap characterization of Ta_2O_5 thin films deposited by electron gun method

机译：电子枪法沉积Ta_2O_5薄膜的多重分形和光学带隙表征

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摘要

The micromorphology of tantalum pentoxide (Ta_2O_5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV-Vis-NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7x10~(-6) mbar, work pressures of 1.3x10~(-4) and 2.0X10~(-4) mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 ℃ for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta_2O_5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
机译：利用原子力显微镜（AFM），UV-Vis-NIR分光光度法和多重分形分析，分析了通过电子枪法沉积在玻璃基板上的五氧化二钽（Ta_2O_5）薄膜的微观形貌。两个样品分别在7x10〜（-6）mbar的基本压力，1.3x10〜（-4）mbar和2.0X10〜（-4）mbar的工作压力下生长，厚度分别为0.38μm和0.39μm。随后，将这些样品在300℃退火2 h。物理，结构和光学分析通过光谱椭偏法，分光光度法和原子力显微镜研究。基于Swanepoel方法研究了测得的透射光谱，其结果也有助于估计膜的厚度和折射率。最后，通过AFM测量和多重分形分析对Ta_2O_5薄膜进行了表征，以准确描述3-D表面微观纹理特征。样品的分形检查​​表明，这些微观结构表现出多重分形特征。比较并详细讨论了表征薄膜的基本参数。

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