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首页> 外文期刊>Optical engineering >Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites
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Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites

机译:在重氮萘醌-酚醛清漆基光刻胶及其纳米复合材料上用脉冲激光记录全息图

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摘要

Direct write digital holography technique (DWDH) using a single 440-nm pulsed laser exposure has been proposed to record master holograms on commercially available positive-tone photoresist systems based on a mixture of diazonaphthoquinone and novolac resin (DNQ-novolac) of different thicknesses. The DNQ-novolac nanocomposite doped with copper nanoparticles (CuNPs) films was also used. The method for numerical evaluation of hologram quality based on reflected beam diffraction intensity measurements was proposed and verified. It was found that all investigated photoresist nanocomposites were sensitive enough to record holographic structures at low single pulse laser exposures (from 3.3 to 18.0 mJ/cm~2). Moreover, doping DNQ-novolac nanocomposite with CuNPs s increases its sensitivity to pulsed laser exposure by more than 30%. The potential of single pulsed laser exposures to record high quality master holograms on commercially available and metal nanoparticles doped photoresists with at least five times lower exposures values as compared to the continuous-wave laser exposures usually used to expose photoresist materials in holographic applications, opens the possibility to use pulsed lasers for quick master-originals origination for embossed holograms applying a DWDH technique or analog methods.
机译:已经提出使用单次440-nm脉冲激光曝光的直接写数字全息技术(DWDH),以在市售的基于重氮萘醌和不同酚醛清漆树脂(DNQ-novolac)混合物的正性光刻胶系统上记录主全息图。还使用了掺杂有铜纳米颗粒(CuNPs)薄膜的DNQ-novolac纳米复合材料。提出并验证了基于反射光束衍射强度测量的全息图质量数值评估方法。发现所有研究的光致抗蚀剂纳米复合材料都足够灵敏,可以在低单脉冲激光曝光(从3.3至18.0 mJ / cm〜2)下记录全息结构。此外,用CuNPs掺杂DNQ-novolac纳米复合材料可将其对脉冲激光暴露的敏感性提高30%以上。单脉冲激光曝光具有在市售和掺杂金属纳米颗粒的光致抗蚀剂上记录高质量主全息图的潜力,其曝光值比全息照相应用中通常用于曝光光致抗蚀剂材料的连续波激光曝光低至少五倍。使用DWDH技术或模拟方法将脉冲激光用于浮雕全息图的快速原版原点打印的可能性。

著录项

  • 来源
    《Optical engineering》 |2014年第9期|097101.1-097101.8|共8页
  • 作者单位

    Geola Digital UAB, Naugarduko Street 41, Vilnius LT-03227, Lithuania, Kaunas University of Technology, Department of Physics, Studentu Street 50, Kaunas LT-51368, Lithuania;

    Geola Digital UAB, Naugarduko Street 41, Vilnius LT-03227, Lithuania, Kaunas University of Technology, Department of Materials Engineering, Studentu Street 56, Kaunas LT-51424, Lithuania;

    Kaunas University of Technology, Department of Physics, Studentu Street 50, Kaunas LT-51368, Lithuania;

    Kaunas University of Technology, Department of Physics, Studentu Street 50, Kaunas LT-51368, Lithuania;

    Kaunas University of Technology, Department of Physics, Studentu Street 50, Kaunas LT-51368, Lithuania, Kaunas University of Technology, Institute of Materials Science, Savanoriu 271, Kaunas, LT-50131, Lithuania;

    Kaunas University of Technology, Department of Physics, Studentu Street 50, Kaunas LT-51368, Lithuania, Kaunas University of Technology, Department of Materials Engineering, Studentu Street 56, Kaunas LT-51424, Lithuania;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    direct write digital holography; pulsed laser; hogels; photoresist; copper nanoparticles; nanocomposites; master hologram;

    机译:直接写数字全息术;脉冲激光霍格斯光刻胶铜纳米粒子纳米复合材料主全息图;

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