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Effects of annealing on the residual stresses distribution and the structural properties of Si core fiber

机译：退火对硅芯纤维残余应力分布及结构性能的影响

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摘要

Effects of annealing on the residual stresses distribution and structural properties of Si core fiber cross-section are mainly investigated using Raman spectra map, scanning electron microscope (SEM) and X-ray diffraction. The annealing was carried out at 800 degrees C, 1000 degrees C, and 1200 degrees C, respectively by muffle furnace. The experimental results show that defects distribution has more obvious effects than the different characters between core and cladding on the residual stresses at the inner area of Si core cross-section. The defects distribution relate to the temperature field distribution during the process of drawing fiber. Annealing could decrease the residual stresses and make the distribution of residual stresses uniform effectively. For all samples, the Si core annealed at 1200 degrees C has the smallest residual stresses and the most uniform residual stresses distribution. The residual stresses of 155-437.5 MPa mainly caused by different characters between Si core and SiO2 cladding distribute at the narrow ring area near the inner surface of cladding. This area is very likely to be composed by grains which is smaller than grains in the inner, and has looser microstructure than the inner. It exists like a buffer layer. Annealing could also improve the crystal quality of Si core. After annealed at 1200 degrees C, the high intensity diffraction peak of the (3 1 1) plane is generated in the X-ray diffraction spectra.
机译：主要利用拉曼光谱图，扫描电子显微镜（SEM）和X射线衍射研究了退火对硅芯纤维横截面残余应力分布和结构性能的影响。通过马弗炉分别在800℃，1000℃和1200℃下进行退火。实验结果表明，缺陷分布对硅芯截面内部区域的残余应力的影响比芯和包层之间的不同特征更为明显。缺陷分布与拉伸纤维过程中的温度场分布有关。退火可以减少残余应力，使残余应力的分布有效均匀。对于所有样品，在1200℃退火的Si芯具有最小的残余应力和最均匀的残余应力分布。 155-437.5 MPa的残余应力主要是由Si芯和SiO2包层之间的不同特性引起的，分布在包层内表面附近的窄环区域。该区域很可能由比内部的晶粒小的晶粒组成，并且具有比内部的晶粒更松散的微观结构。它像缓冲层一样存在。退火还可以改善Si核的晶体质量。在1200℃退火后，在X射线衍射光谱中产生（3 1 1）面的高强度衍射峰。

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  • 来源
    《Optical fiber technology》 |2018年第3期|193-199|共7页
  • 作者

    Zhao Ziwen; Xue Fei; Mao Yujizhe; Chen Na; Wang Tingyun;

  • 作者单位

    Shanghai Univ, Shanghai Inst Adv Commun & Data Sci, Sch Commun & Informat Engn, Key Lab Specialty Fiber Opt & Opt Access Networks, Shanghai 200072, Peoples R China;

    Shanghai Univ, Shanghai Inst Adv Commun & Data Sci, Sch Commun & Informat Engn, Key Lab Specialty Fiber Opt & Opt Access Networks, Shanghai 200072, Peoples R China;

    Shanghai Univ, Shanghai Inst Adv Commun & Data Sci, Sch Commun & Informat Engn, Key Lab Specialty Fiber Opt & Opt Access Networks, Shanghai 200072, Peoples R China;

    Shanghai Univ, Shanghai Inst Adv Commun & Data Sci, Sch Commun & Informat Engn, Key Lab Specialty Fiber Opt & Opt Access Networks, Shanghai 200072, Peoples R China;

    Shanghai Univ, Shanghai Inst Adv Commun & Data Sci, Sch Commun & Informat Engn, Key Lab Specialty Fiber Opt & Opt Access Networks, Shanghai 200072, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Si core fiber; Annealing; Residual stresses distribution; Crystal quality;

    机译：硅芯纤维;退火;残余应力分布;晶体质量;

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