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首页> 外文期刊>Optical Materials >Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process
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Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process

机译：HF蚀刻过程中熔融石英光学元件的表面缺陷表征和激光损伤性能

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摘要

Subsurface defects of fused silica optics would vary with HF-etched process. In this paper, the subsurface defects characteristics of HF-etched fused silica optics and their effects on laser induced damage were investigated. The results suggest that most of metal impurities defects (especially Ce element) of fused silica optics can be dissolved in strong acid solution. Subsurface damage can be removed by submerging fused silica optics in HF-based etchants. Laser damage resistance is improved through the removal of metal impurities and subsurface damage. Optical thermal absorption describes the laser absorption char acterization of fused silica subsurface layer. A good correlation between optical thermal absorption and laser-induced damage performance is shown in this paper. Laser damage performance deteriorates when the HF-based etching depth exceeds one value, which can be explained by the impurities redeposition and surface roughness increase. Research results have a guiding significance for HF-based etching process technology of fused silica optics.
机译：熔融石英光学元件的表面缺陷会随HF蚀刻工艺而变化。本文研究了HF刻蚀熔融石英光学元件的表面缺陷特征及其对激光损伤的影响。结果表明，熔融石英光学元件的大多数金属杂质缺陷（尤其是Ce元素）都可以溶解在强酸溶液中。通过将熔融石英光学器件浸入HF基蚀刻剂中，可以消除表面下的损坏。通过去除金属杂质和表面下的损伤，提高了抗激光损伤的能力。光学热吸收描述了熔融石英表面下层的激光吸收特性。本文显示了光热吸收与激光诱导的损伤性能之间的良好相关性。当基于HF的蚀刻深度超过一个值时，激光损伤性能劣化，这可以通过杂质再沉积和表面粗糙度增加来解释。研究结果对熔融石英光学器件的基于HF的蚀刻工艺技术具有指导意义。

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