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首页> 外文期刊>Optical Materials >Fabrication of polarization grating and surface relief grating in crosslinked and non-crosslinking azopolymer by polarization holography method
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Fabrication of polarization grating and surface relief grating in crosslinked and non-crosslinking azopolymer by polarization holography method

机译：偏振全息法在交联和非交联偶氮聚合物中制备偏振光栅和表面起伏光栅

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摘要

Pure polarization grating without surface topology on crosslinked azopolymer film was fabricated upon exposure to an interference pattern of orthogonal linearly polarized beams from a He-Cd laser without any subsequent processing steps. The grating structure was investigated using atomic force microscopy and polarization optical microscopy. A regular spaced grating but without surface relief was observed. The grating was stable at ambient conditions and can endure repeated writing-erasing processes. The interference mode of writing beam had a significant effect on grating formation and was investigated by using the two patterns of orthogonal linearly polarized beams (polarization-modulated mode) and parallel linearly polarization beams (intensity-modulated mode). The effect of material cross-linking was also studied by comparing the surface relief depth on the grating formation process between crosslinked and non-crosslinking azopolymer films. Experiment results demonstrated that the surface relief grating was observed on non-crosslinking azopolymer film. For intensity-modulated interference mode, whatever crosslinked and non-crosslinking azopolymer films, the surface relief gratings were fabricated.
机译：在暴露于来自He-Cd激光器的正交线性偏振光束的干涉图样而没有任何后续处理步骤的情况下，制造出在交联的偶氮聚合物膜上没有表面拓扑结构的纯偏振光栅。使用原子力显微镜和偏振光学显微镜研究了光栅结构。观察到规则间隔的光栅但没有表面起伏。光栅在环境条件下是稳定的，并且可以承受重复的写入擦除过程。写入光束的干涉模式对光栅的形成有显着影响，并使用正交线性偏振光束（偏振调制模式）和平行线性偏振光束（强度调制模式）的两种模式进行研究。还通过比较表面浮雕深度对交联和非交联偶氮聚合物薄膜之间光栅形成过程的影响，研究了材料交联的影响。实验结果表明，在非交联的偶氮聚合物薄膜上观察到了表面起伏光栅。对于强度调制的干涉模式，无论交联和非交联的偶氮聚合物薄膜如何，都制造了表面起伏光栅。

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