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首页> 外文期刊>Optical Materials >Er-doped oxyfluoride silicate thin films prepared by pulsed laser deposition
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Er-doped oxyfluoride silicate thin films prepared by pulsed laser deposition

机译：通过脉冲激光沉积制备掺Er的氟氧化物硅酸盐薄膜

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摘要

Er-doped oxyfluoride silicate thin films were deposited using pulsed laser deposition. The target glass composition was 65SiO_2-3Al_2O_3-12Na_2O-10PbF_3-10LaF_3 (in mol%) + 1Er_2O_3 (in wt.%). Irradiations were performed using an ArF excimer laser in a dynamic flow of oxygen of pressure 5 Pa. The laser fluence at the target surface was 2 J/cm~2. Films were deposited on pure silica substrates, either at room temperature or on a substrate-holder heated at 200℃. The optical transmission of the films in the NIR-visible-UV regions (200-2500 nm) was recorded using a double beam spectrophotometer and was higher than 90%. The optical spectra were analyzed using computer code to evaluate the refraction index (n), the extinction coefficient (k) along with the film thickness. The films deposited at room temperature were cracked whilst examined under scanning electron microscopy and reactive ion etching. By comparison, the films deposited at 200℃ remained undamaged. Optical waveguides were written on the films deposited at 200℃ using dry reactive ion etching with attenuation in the range of 0.74 dB/cm at 633 nm, measured using a prism coupler.
机译：使用脉冲激光沉积来沉积掺Er的氟氧化硅酸盐薄膜。目标玻璃组成为65SiO_2-3Al_2O_3-12Na_2O-10PbF_3-10LaF_3（以摩尔％计）+ 1Er_2O_3（以重量％计）。使用ArF准分子激光在5Pa的动态氧气流中进行辐照。目标表面的激光通量为2 J / cm〜2。在室温下或在200℃下加热的基板支架上，将膜沉积在纯二氧化硅基板上。使用双光束分光光度计记录薄膜在NIR-可见-紫外线区域（200-2500 nm）的透光率，该透光率高于90％。使用计算机代码分析光谱，以评估折射率（n），消光系数（k）以及薄膜厚度。在室温下沉积的膜破裂，同时在扫描电子显微镜和反应离子蚀刻下检查。相比之下，在200℃下沉积的膜仍未受损。使用干反应离子刻蚀在200℃沉积的薄膜上写入光波导，使用棱镜耦合器测量，在633 nm处衰减在0.74 dB / cm范围内。

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