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Properties of silica and silica-titania layers fabricated from silica sols containing fumed silica

机译：由含气相二氧化硅的二氧化硅溶胶制备的二氧化硅和二氧化硅-二氧化钛层的性能

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Silica layers fabricated by the sol-gel method are usually amorphous and exhibit a relatively low refractive index (n similar to 1.46 at about 0.6 mu m), high optical transmittances at UV-VIS and near-IR ranges, as well as high thermal stability. Such layers can be used as high reflection or antireflection coatings, dielectric mirrors, bandpass filters, etc. However, crack-free layers with a maximum thickness of about 400 nm can be prepared in one coating cycle from sols of simple silicon alkoxides. This paper presents an approach for the preparation of crack-free silica layers that allows us to increase this maximum thickness. The approach is based on the dip-coating technique used for applying stable silica sols containing fumed silica. These sols were obtained from input silica sols based on tetraethyl orthosilicate (TEOS) with concentrations 1 and 2 mol/l, ethanol, HCl and water (RW 1.75). Fumed silica was dispersed in water/TritonX-100 solution and added into some of the input sols. Zeta potentials, average dimensions and diffusion coefficients of silica agglomerates in sols containing fumed silica are presented. Both types of sols were deposited onto silica slides and silicon wafers by the dip-coating technique using different withdrawing velocities 100,200 and 300 mm/min. Prepared silica gel layers were thermally treated at 450 or 900 degrees C. One of silica sols with fumed silica has also been used for the preparation of a silica-titania sol with a molar ratio Ti/Si = 3/7. Both these sols have been employed for the preparation of a Bragg mirror consisting of three pairs of high-index silica-titania and low index silica layers on a silica slide.
机译：通过溶胶-凝胶法制备的二氧化硅层通常是非晶态的，并且表现出相对较低的折射率（n在约0.6μm处与1.46相似），在UV-VIS和近红外范围内具有高透光率以及高热稳定性。此类层可用作高反射或抗反射涂层，介电镜，带通滤光片等。但是，可以在一个涂覆周期中由简单的烷氧基硅溶胶制备最大厚度约为400 nm的无裂纹层。本文介绍了一种制备无裂纹二氧化硅层的方法，该方法使我们能够增加此最大厚度。该方法基于浸涂技术，该浸涂技术用于施加包含气相法二氧化硅的稳定二氧化硅溶胶。这些溶胶是从基于浓度为1和2 mol / l的原硅酸四乙酯（TEOS），乙醇，HCl和水（RW 1.75）的输入硅溶胶中获得的。将气相二氧化硅分散在水/ TritonX-100溶液中，并添加到某些输入溶胶中。给出了含气相二氧化硅的溶胶中二氧化硅团聚体的ζ电位，平均尺寸和扩散系数。两种类型的溶胶都通过浸涂技术使用不同的撤离速度100,200和300 mm / min沉积在二氧化硅载玻片和硅片上。在450或900℃下对制备的硅胶层进行热处理。具有热解法二氧化硅的二氧化硅溶胶也已经用于制备摩尔比为Ti / Si ＝ 3/7的二氧化硅-二氧化钛溶胶。这两种溶胶都已用于制备布拉格镜，该布拉格镜由二氧化硅滑片上的三对高折射率二氧化硅-二氧化钛和低折射率二氧化硅层组成。

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