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首页> 外文期刊>Optics and Lasers in Engineering >Experimental study of Talbot imaging moire-based lithography alignment method
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Experimental study of Talbot imaging moire-based lithography alignment method

机译：基于Talbot成像云纹的光刻对准方法的实验研究

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摘要

A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method.
机译：提出了一种四象限光栅对准方法，用于近距离光刻，实验上达到了纳米级的对准精度。对准标记由周期略有不同的光栅组成，导致同一单色平面波的Talbot距离不同。莫尔条纹的对比度随掩模（对准标记）和晶圆（对准标记）之间的间隙而变化，这将影响相位比较，并引起更多的误差。本文着重于对准标记参数的优化，以得到具有最佳对比度的波纹条纹。通过仿真和实验，研究了间隙对对比度的影响，在此基础上，得出了对准标记的设计原理，对本文提出的对准方法具有实用性。

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  • 来源
    《Optics and Lasers in Engineering》 |2014年第7期|54-59|共6页
  • 作者

    Jiangping Zhu; Song Hu; Pei Zhou; Junsheng Yu;

  • 作者单位

    Chinese Academy of Sciences, Institution of Optics & Electronics, PO Box 350, Shuangliu, Chengdu 610209, China,School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China,University of Chinese Academy of Sciences, Beijing 100039, China;

    Institution of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

    Institution of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China,University of Chinese Academy of Sciences, Beijing 100039, China;

    School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Alignment; Moire techniques; Gratings; Talbot and self-imaging effects;

    机译：对准;波纹技术;光栅;Talbot和自我成像效果;

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