Spectral interferometric technique to measure the ellipsometric phase of a thin-ﬁlm structure

Petr Hlubina* Dalibor Ciprian and Jiri Lunacek

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Spectral interferometric technique to measure the ellipsometric phase of a thin-ﬁlm structure

机译：光谱干涉技术测量薄膜结构的椭圆偏振相位

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A two-step white-light spectral interferometric technique is used to retrieve the ellipsometric phase of anthin-ﬁlm structure from the spectral interferograms recorded in a polarimetry conﬁguration with a birefrin-ngent crystal. In the ﬁrst step, the phase difference between p- and s-polarized waves propagating in thencrystal alone is retrieved. In the second step, the additional phase change that the polarized waves undergonon reﬂection from the thin-ﬁlm structure is retrieved. The new method is used in determining the thin-ﬁlmnthickness from ellipsometric phase measured for SiO2 thin ﬁlm on a Si substrate in a range fromn550 to 900 nm. The thicknesses of three different samples obtained are compared with those resulting fromnpolarimetric measurements, and good agreement is conﬁrmed. © 2009 Optical Society of America

机译：使用两步白光光谱干涉技术，从以双折射-晶体结晶的偏振光谱中记录的光谱干涉图中检索蒽菲林膜结构的椭圆偏振相位。在第一步中，仅在晶体中传播的p极化波和s极化波之间的相位差就可以得到。在第二步中，获取偏振波未从薄膜结构反射的附加相变。该新方法用于根据椭圆偏振法确定的薄厚度，该厚度是在550nm至900nm范围内的Si衬底上测量SiO2薄膜的厚度。将获得的三个不同样品的厚度与通过极化测量得到的厚度进行比较，并确认了良好的一致性。 ©2009美国眼镜学会

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《Optics Letters》 |2009年第17期|p.2661-2663|共3页
作者
Petr Hlubina* Dalibor Ciprian and Jiri Lunacek;
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Department of Physics, Technical University Ostrava, 17 Listopadu 15, 708 33 Ostrava-Poruba, Czech Republic* Corresponding author: petr.hlubina@vsb.cz;

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1. Spectral interferometric technique to measure the ellipsometric phase of a thin-film structure [J] . Petr Hlubina, Dalibor Ciprian, Jiri Lunacek Optics Letters . 2009,第17期

机译：光谱干涉法测量薄膜结构的椭偏相位
2. Spectral interferometric technique to measure the relative phase change on reflection from a thin-film structure [J] . P. Hlubina, D. Ciprian, J. Lunacek Applied physics . 2010,第4期

机译：光谱干涉测量技术，用于测量薄膜结构反射时的相对相位变化
3. Spectral interferometric technique to measure the relative phase change on reflection from a thin-film structure [J] . P. Hlubina, D. Ciprian, J. Luňáček Applied Physics B: Lasers and Optics . 2010,第4期

机译：光谱干涉测量技术，用于测量薄膜结构反射时的相对相位变化
4. White-light spectral interferometric technique used to measure thickness of thin films [C] . P. Hlubina, D. Ciprian, R. Clebus, Optical Measurement Systems for Industrial Inspection V pt.1; Proceedings of SPIE-The International Society for Optical Engineering; vol.6616 pt.1 . 2007

机译：用于测量薄膜厚度的白光光谱干涉技术
5. Investigation of dynamics and structure development during uniaxial stretching of PET films at different molecular weights using fully automated spectral birefringence technique. [D] . Sen, Taner Zafer. 2003

机译：使用全自动光谱双折射技术研究在不同分子量的PET薄膜的单轴拉伸过程中的动力学和结构发展。
6. Characterization of oviduct ciliary beat frequency using real time phase resolved Doppler spectrally encoded interferometric microscopy [O] . Youmin He, Yueqiao Qu, Joseph C. Jing, 2019

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7. Spectral interferometric technique to measure the ellipsometric phase of a thin-film structure [O] . Hlubina Petr, Ciprian Dalibor, Luňáček Jiří 2009

机译：光谱干涉法测量薄膜结构的椭圆相
8. Passive Films, Surface Structure and Stress Corrosion and Crevice Corrosion Susceptibility. Part I. A Qualitative Ellipsometric-Electrochemical Approach for the Study of Film Growth under Organic Coatings. Part II. Hydrogen Intera [R] . Kruger, J., Carroll, J. J., Melmed, A. J., 1980

机译：被动薄膜，表面结构和应力腐蚀和缝隙腐蚀敏感性。第一部分定性椭偏 - 电化学方法研究有机涂层下的薄膜生长。第二部分。氢互作用

Spectral interferometric technique to measure the ellipsometric phase of a thin-ﬁlm structure

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