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首页> 外文期刊>Oxidation of Metals >Studies on the Surface Chemistry of Oxide Films Formed on IN-738LC Superalloy at Elevated Temperatures in Dry Air
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Studies on the Surface Chemistry of Oxide Films Formed on IN-738LC Superalloy at Elevated Temperatures in Dry Air

机译:高温下在干燥空气中在IN-738LC高温合金上形成的氧化膜的表面化学研究

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The oxidation behavior of IN-738LC was studied to develop high-temperature materials for low cost and highly efficient turbine systems. The present study was undertaken to investigate the kinetics and the surface chemistry of the oxide films formed during isothermal oxidation of IN-738LC superalloy in the temperature range 1123–1223 K in dry air. The oxidation kinetics followed the parabolic law. The activation energy of oxidation was 264 kJ mol−1. The scaling process is controlled mainly by the diffusion of chromium ions through the intermediate chromia layer in the scale. The surface morphology and the oxide phases of the scale were characterized by SEM, XRD, and EDS studies. XRD analysis revealed the presence of NiO, NiAl2O4, NiCr2O4 spinel, Al2O3, and Cr2O3 on the top-scale surface. The scale surface and cross section were further characterized using X-ray photoelectron spectroscopy (XPS), which revealed the presence of NiO, Ni2O3, NiAl2O4, Al2O3, and TiO2 on the top-oxide surface. The chromia layer was found to be underneath the top scale. The chromia layer also contains NiCr2O4 and NiAl2O4 spinels along with Al2O3. Application of XPS was found to be successful to understand the oxide-scale chemistry in terms of the oxide-growth mechanism of IN-738LC at elevated temperatures.
机译:研究了IN-738LC的氧化行为,以开发用于低成本和高效涡轮机系统的高温材料。本研究旨在研究IN-738LC高温合金在1123-1223 K温度范围内在干燥空气中等温氧化过程中形成的氧化膜的动力学和表面化学性质。氧化动力学遵循抛物线定律。氧化的活化能为264 kJ mol-1。结垢过程主要通过铬离子通过水垢中的中间氧化铬层的扩散来控制。通过SEM,XRD和EDS研究表征了氧化皮的表面形态和氧化相。 X射线衍射分析表明存在NiO,NiAl2 O4 ,NiCr2 O4 尖晶石,Al2 O3 和Cr2 O3 < / sub>在顶级表面上。 X射线光电子能谱(XPS)进一步表征了氧化铁皮的表面和横截面,发现存在NiO,Ni2 O3 ,NiAl2 O4 ,Al2 < / sub> O3 和TiO2 在顶部氧化物表面。发现氧化铬层在顶标之下。氧化铬层还包含NiCr2 O4 和NiAl2 O4 尖晶石以及Al2 O3 。发现XPS的应用成功地理解了IN-738LC在高温下的氧化物生长机理方面的氧化物级化学。

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