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首页> 外文期刊>Philosophical Magazine Letters >Supercapacitor behaviour of cobalt-doped nickel oxide films
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Supercapacitor behaviour of cobalt-doped nickel oxide films

机译：钴掺杂氧化镍薄膜的超级电容器行为

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Ordered nanostructured cobalt-doped nickel oxide films were prepared on a conducting glass substrate via the sol-gel dip-coating method. X-ray diffraction analysis shows the films to be amorphous. Field-emission scanning electron microscope images showed well-defined, ordered grains with pores in between them. Supercapacitor behaviour was studied using cyclic voltammetry. A maximum specific capacitance of 1982 F/g at a scan rate of 5 mV/s with 1 M KOH was obtained for 5 wt% of cobalt-doped nickel oxide films. AC impedance analysis showed that the solution resistance was R s = 27 Ω and the charge transfer resistance R ct = 20 Ω.View full textDownload full textKeywordsnanoporous materials, sol-gel processes, supercapacitor, XRD, FESEMRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/09500839.2012.685961
机译：通过溶胶-凝胶浸涂法在导电玻璃基板上制备了有序的纳米结构钴掺杂氧化镍薄膜。 X射线衍射分析表明该膜是无定形的。场发射扫描电子显微镜图像显示轮廓清晰，有序的晶粒，且晶粒之间有孔。使用循环伏安法研究了超级电容器的行为。对于5wt％的钴掺杂氧化镍膜，获得的最大比电容为1982 F / g，扫描速率为5 mV / s和1 M KOH。交流阻抗分析表明，溶液电阻为R s = 27，而电荷转移电阻R ct ==。 20‰。查看全文下载全文关键字纳米多孔材料，溶胶-凝胶工艺，超级电容器，XRD，FESEM相关的var addthis_config = {ui_cobrand：“泰勒和弗朗西斯在线”，servicescompact：“同胞，netvibes，twitter，technorati，美味， linkedin，facebook，stumbleupon，digg，google，更多“，发布ID：” ra-4dff56cd6bb1830b“};添加到候选列表链接永久链接http://dx.doi.org/10.1080/09500839.2012.685961

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