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Nodal-line semimetals from Weyl superlattices

机译:Weyl超晶格的节点线半金属

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摘要

The existence and topological classification of lower-dimensional Fermi surfaces is often tied to the crystal symmetries of the underlying lattice systems. Artificially engineered lattices, such as heterostructures and other superlattices, provide promising avenues to realize desired crystal symmetries that protect lower-dimensional Fermi surfaces, such as nodal lines. In this work, we investigate a Weyl semimetal subjected to spatially periodic onsite potential, giving rise to several phases, including a nodal-line semimetal phase. In contrast to proposals that purely focus on lattice symmetries, the emergence of the nodal line in this setup does not require small spin-orbit coupling, but rather relies on its presence. We show that the stability of the nodal line is understood from reflection symmetry and a combination of a fractional lattice translation and charge-conjugation symmetry. Depending on the choice of parameters, this model exhibits drumhead surface states that are exponentially localized at the surface, or weakly localized surface states that decay into the bulk at all energies.
机译:低维费米表面的存在和拓扑分类通常与基础晶格系统的晶体对称性有关。人工工程化的晶格,例如异质结构和其他超晶格,为实现所需的晶体对称性提供了有希望的途径,从而可以保护低维费米表面(例如节线)。在这项工作中,我们研究了Weyl半金属在空间上周期性发生的现场电势,产生了多个相,包括节点线半金属相。与仅关注晶格对称性的提议相反,在这种设置中节点线的出现不需要小的自旋轨道耦合,而是依赖于它的存在。我们表明,从反射对称以及分数格平移和电荷共轭对称的组合可以理解节点线的稳定性。根据参数的选择,此模型显示的鼓面表面状态呈指数分布在表面,或者局部弱化的表面状态在所有能量下均衰减为体积。

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  • 来源
    《Physical review》 |2017年第24期|245101.1-245101.10|共10页
  • 作者单位

    Max-Planck-Institut fuer Physik komplexer Systeme, 01187 Dresden, Germany;

    Max-Planck-Institut fuer Physik komplexer Systeme, 01187 Dresden, Germany;

    Department of Physics, Harvard University, Cambridge, Massachusetts 02138, USA;

    Department of Physics, University of California, Berkeley, California 94720, USA,Institut Neel, CNRS and University Grenoble Alpes, F-38042 Grenoble, France;

    Max-Planck-Institut fuer Physik komplexer Systeme, 01187 Dresden, Germany,Department of Physics, KTH Royal Institute of technology, Stockholm, SE-106 91 Sweden;

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