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首页> 外文期刊>Physical review >Low-temperature B2 ordering and magnetic properties of Fe_(100-x)Rh_x films on bcc alloys
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Low-temperature B2 ordering and magnetic properties of Fe_(100-x)Rh_x films on bcc alloys

机译：bcc合金上Fe_（100-x）Rh_x薄膜的低温B2有序性和磁性

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摘要

B2-ordered Fe_(100-x)Rh_x alloys, which exhibit a first-order magnetic phase transition from an antiferromagnetic state to a ferromagnetic one at around 350 K, have so far been formed by high-temperature heat treatments above 600 ℃. Here we demonstrate low-temperature (200 ℃) growth of B2-ordered Fe_(100-x)Rh_x films on body-centered-cubic (bcc) alloys. By using molecular beam epitaxy with an insertion of D0_3-ordered Fe_3Si buffer layers, which have good atomic arrangement matching with Fe_(100-x)Rh_x along (111), B2-ordered Fe_(100-x)Rh_x films having a sharp magnetic phase transition can be obtained at 200℃ even in as-grown conditions. We find that the disordered structures are mainly derived from the lattice strain in the Fe_(100-x)Rh_x films due to the lattice mismatch between Fe_(100-x)Rh_x and the buffer layers. We discuss the role of heat treatments and other buffer structures on the B2-ordering and magnetic properties for Fe_(100-x)Rh_x films.
机译：到目前为止，通过600℃以上的高温热处理已形成B2级Fe_（100-x）Rh_x合金，该合金在350 K左右具有从反铁磁态到铁磁态的一阶磁相转变。在这里，我们证明了在体心立方（bcc）合金上B2有序Fe_（100-x）Rh_x薄膜的低温（200℃）生长。通过使用分子束外延并插入D0_3阶Fe_3Si缓冲层（其具有沿（111）与Fe_（100-x）Rh_x匹配的良好原子排列），可以使B2阶Fe_（100-x）Rh_x膜具有明显的磁性即使在生长条件下，也可以在200℃下获得相变。我们发现，由于Fe_（100-x）Rh_x与缓冲层之间的晶格失配，无序结构主要源自Fe_（100-x）Rh_x膜中的晶格应变。我们讨论了热处理和其他缓冲结构对Fe_（100-x）Rh_x薄膜的B2有序性和磁性的作用。

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  • 来源
    《Physical review》 |2015年第9期|094416.1-094416.7|共7页
  • 作者

    S. Yamada; K. Tanikawa; J. Hirayama; T. Kanashima; T. Taniyama; K. Hamaya;

  • 作者单位

    Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan,Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan,Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan;

    Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan,Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

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  • 正文语种 eng
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  • 关键词

    fe and its alloys; magnetic properties of monolayers and thin films; molecular, atomic, ion, and chemical beam epitaxy;

    机译：Fe及其合金;单层和薄膜的磁性分子;原子;离子和化学束外延;

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