...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Physical review >Casimir and van der Waals energy of anisotropic atomically thin metallic films
【24h】

Casimir and van der Waals energy of anisotropic atomically thin metallic films

机译：各向异性原子薄金属膜的卡西米尔和范德华力

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

We discuss the van der Waals (Casimir) free energies and pressures of thin metallic films, consisting of from one to fifteen atomic layers, with regard to the anisotropy in their dielectric properties. Both freestanding films and films deposited on a dielectric substrate are considered. The computations are performed for a Au film and a sapphire substrate. According to our results, for freestanding Au films consisting of one and three atomic layers the respective relative error arising from the use of an isotropic (bulk) dielectric permittivity is equal to 73% and 37% for the van der Waals energy, and 70% and 35% for the pressure. We tabulate the energy and pressure van der Waals coefficients of thin Au films computed with account of their anisotropy. It is shown that the bulk permittivity of Au can be used for the films consisting of more than 30 atomic layers, i.e., more than approximately 7 nm thickness. The role of relativistic effects is also investigated and shown to be important even for the films consisting of two or three layers. The obtained results can find applications in the investigation of the stability of thin films and the development of novel nanoscale devices.
机译：我们讨论了由1到15个原子层组成的金属薄膜的范德华（Casimir）自由能和压力，以及它们的介电特性各向异性。独立膜和沉积在电介质基底上的膜都被考虑。对Au膜和蓝宝石衬底执行计算。根据我们的结果，对于由一原子层和三原子层组成的独立式金膜，使用各向同性（体）介电常数引起的相对误差分别为范德华力的73％和37％，而70％和35％的压力。我们将考虑到各向异性的Au薄膜的能量和压力范德华系数制成表格。结果表明，Au的体介电常数可用于由超过30个原子层即大于约7nm的厚度组成的膜。还研究了相对论效应的作用，即使对于由两层或三层组成的薄膜，它也很重要。获得的结果可用于研究薄膜的稳定性和开发新型纳米器件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号