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首页> 外文期刊>Physical review >Lattice instability and elastic response of metastable Mo_(1-x)Si_x thin films
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Lattice instability and elastic response of metastable Mo_(1-x)Si_x thin films

机译：亚稳Mo_（1-x）Si_x薄膜的晶格不稳定性和弹性响应

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摘要

We present a detailed experimental study on Mo_(1-x)Si_x thin films, an archetypal alloy system combining metallic and semiconductor materials. The correlations between structure and elastic response are comprehensively investigated. We focus on assessing trends for understanding the evolution of elastic properties upon Si alloying in relation to the structural state (crystalline vs amorphous), bonding character (metallic vs covalent), and local atomic environment. By combining picosecond ultrasonics and Brillouin light scattering techniques, a complete set of effective elastic constants and mechanical moduli (B, G, E) is provided in the whole compositional range, covering bcc solid solutions (x ＜ 0.20) and the amorphous phase (0.20 ＜ x ＜ 1.0). A softening of the shear and Young moduli and a concomitant decrease of the Debye temperature is revealed for crystalline alloys, with a significant drop being observed at x ~ 0.2 corresponding to the limit of crystal lattice stability. Amorphous alloys exhibit a more complex elastic response, related to variations in coordination number, atomic volume, and bonding state, depending on Si content. Finally, distinct evolutions of the G/B ratio as a function of Cauchy pressure are reported for crystalline and amorphous alloys, enabling us to identify signatures of ductility vs brittleness in the features of the local atomic environment. This work paves the way to design materials with improved mechanical properties by appropriate chemical substitution or impurity incorporation during thin-film growth.
机译：我们介绍了Mo_（1-x）Si_x薄膜的详细实验研究，该薄膜是结合金属和半导体材料的原型合金系统。全面研究了结构与弹性响应之间的关系。我们专注于评估趋势，以了解与结构状态（晶体相对于非晶态），键合特性（金属相对于共价态）和局部原子环境有关的硅合金化时弹性特性的演变。通过结合皮秒超声波和布里渊光散射技术，可在整个组成范围内提供一整套有效的弹性常数和机械模量（B，G，E），涵盖密闭cc固溶体（x ＜0.20）和非晶相（0.20） ＜x ＜1.0）。对于结晶合金，显示出剪切和杨氏模量的软化以及德拜温度的同时降低，在x〜0.2处观察到显着的下降，这对应于晶格稳定性的极限。非晶态合金表现出更复杂的弹性响应，这取决于硅含量，与配位数，原子量和键合状态的变化有关。最后，据报道，晶体和非晶态合金的G / B比随柯西压力的变化明显，这使我们能够在局部原子环境特征中识别延性与脆性的特征。这项工作为通过在薄膜生长过程中进行适当的化学取代或杂质掺入设计具有改善的机械性能的材料铺平了道路。

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  • 来源
    《Physical review》 |2013年第17期|174104.1-174104.16|共16页
  • 作者

    A. Fillon; C. Jaouen; A. Michel; G. Abadias; C. Tromas; L. Belliard; B. Perrin; Ph. Djemia;

  • 作者单位

    Institut Pprime, Departement Physique et Mecanique des Materiaux, UPR 3346 CNRS, Universite de Poitiers, SP2MI, 11 Boulevard Marie et Pierre Curie, 86962 Futuroscope-Chasseneuil, France,Groupe de Physique des Materiaux-UMR CNRS 6634, Universite de Rouen-UFR Sciences et Techniques, Avenue de l'Universite-BP12, 76801 Saint Etienne du Rouvray, France;

    Institut Pprime, Departement Physique et Mecanique des Materiaux, UPR 3346 CNRS, Universite de Poitiers, SP2MI, 11 Boulevard Marie et Pierre Curie, 86962 Futuroscope-Chasseneuil, France;

    Institut Pprime, Departement Physique et Mecanique des Materiaux, UPR 3346 CNRS, Universite de Poitiers, SP2MI, 11 Boulevard Marie et Pierre Curie, 86962 Futuroscope-Chasseneuil, France;

    Institut Pprime, Departement Physique et Mecanique des Materiaux, UPR 3346 CNRS, Universite de Poitiers, SP2MI, 11 Boulevard Marie et Pierre Curie, 86962 Futuroscope-Chasseneuil, France;

    Institut Pprime, Departement Physique et Mecanique des Materiaux, UPR 3346 CNRS, Universite de Poitiers, SP2MI, 11 Boulevard Marie et Pierre Curie, 86962 Futuroscope-Chasseneuil, France;

    Institut des NanoSciences de Paris, UMR 7588 CNRS, Universite Pierre et Marie Curie, 4 place Jussieu, 75005 Paris, France;

    Institut des NanoSciences de Paris, UMR 7588 CNRS, Universite Pierre et Marie Curie, 4 place Jussieu, 75005 Paris, France;

    Laboratoire des Sciences de Procedes et des Materiaux, UPR 3407 CNRS, Universite Paris 13, 99 Avenue J.B. Clement, 93430 Villetaneuse, France;

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  • 正文语种 eng
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  • 关键词

    mechanical and acoustical properties; thin film structure and morphology; amorphous semiconductors, metals, and alloys;

    机译：机械和声学性能;薄膜的结构和形态;非晶态半导体;金属和合金;

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