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首页> 外文期刊>Physical review >Epitaxial growth, structure, and intermixing at the LaAlO_3/SrTiO_3 interface as the film stoichiometry is varied
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Epitaxial growth, structure, and intermixing at the LaAlO_3/SrTiO_3 interface as the film stoichiometry is varied

机译:随着薄膜化学计量的变化,LaAlO_3 / SrTiO_3界面处的外延生长,结构和混合

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摘要

LaAlO_3 epitaxial films with La: Al cation ratios ranging from 0.9 to 1.2 were grown on TiO_2-terminated SrTiO_3 (001) substrates by off-axis pulsed laser deposition. Although all films are epitaxial, rocking curve measurements show that the crystallographic quality degrades with increasing La:Al ratio. Films with La:Al ratios of 0.9, 1.0, and 1.1 were coherently strained to the substrate. However, the out-of-plane lattice parameter increases over this range, revealing a decrease in film tetragonality. Although all film surfaces exhibit hydroxylation, the extent of hydroxylation is greater for the La-rich films. Rutherford backscattering spectrometry reveals that La from the film diffuses deeply into the SrTiO_3 substrate and secondary-ion-mass spectroscopy shows unambiguous Sr outdiffusion into the films.
机译:通过离轴脉冲激光沉积在TiO_2封端的SrTiO_3(001)衬底上生长La:Al阳离子比为0.9至1.2的LaAlO_3外延膜。尽管所有膜都是外延的,但是摇摆曲线测量表明,随着La:Al比的增加,晶体学质量会下降。 La:Al比率为0.9、1.0和1.1的薄膜会被粘连到基板上。但是,面外晶格参数在此范围内增加,表明薄膜四方性降低。尽管所有膜表面均表现出羟基化,但富La膜的羟基化程度更大。卢瑟福反向散射光谱法表明,薄膜中的La扩散到SrTiO_3衬底中,并且二次离子质谱分析表明Sr明确扩散到薄膜中。

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  • 来源
    《Physical review》 |2011年第8期|p.085408.1-085408.10|共10页
  • 作者单位

    Fundamental and Computational Science Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Fundamental and Computational Science Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Environmental and Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Environmental and Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Environmental and Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Environmental and Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Fundamental and Computational Science Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

    Fundamental and Computational Science Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352, USA;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    interface and surface thermodynamics; crystal stoichiometry; rutherford backscattering (rbs); and other methods of chemical analysis; ion scattering from surfaces (charge transfer; sputtering; sims);

    机译:界面和表面热力学;晶体化​​学计量;卢瑟福反向散射(rbs);化学分析的其他方法;表面的离子散射(电荷转移;溅射;模拟人生);

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