Intrinsic defects in perpendicularly magnetized multilayer thin films and nanostructures

著录项

• 来源
  《Physical review》 |2010年第14期|p.144437.1-144437.7|共7页
• 作者

  Justin M.Shaw; Miles Olsen; June W.Lau; Michael L.Schneider; T.J.Silva; Olav Hellwig; Elizabeth Dobisz; Bruce D.Terris;

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• 作者单位

  National Institute of Standards and Technology, Boulder, Colorado 80305, USA;

  National Institute of Standards and Technology, Boulder, Colorado 80305, USA,University of Montana, Missoula, Montana 59812, USA;

  National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA;

  University of Montana, Missoula, Montana 59812, USA;

  National Institute of Standards and Technology, Boulder, Colorado 80305, USA;

  Hitachi Global Storage Technologies, San Jose, California 95135, USA;

  Hitachi Global Storage Technologies, San Jose, California 95135, USA;

  Hitachi Global Storage Technologies, San Jose, California 95135, USA;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  magnetic properties of thin films; surfaces; and interfaces; magnetization reversal mechanisms;

  机译：薄膜的磁性表面;和接口;磁化反转机制;