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First-principles study of the adsorption of NH_3 on Ag surfaces

机译:NH_3在Ag表面吸附的第一性原理研究

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Ab initio density-functional theory has been used to investigate the adsorption of NH_3 molecules on Ag(111), (001), and (110) surfaces. Preferred adsorption sites, adsorption energies, and the relaxation of the surface structure were calculated using the all-electron full-potential linearized augmented plane wave method. We find that NH_3 binds preferentially at a top site with the C_3 axis normal to the surface. At this site, the N-Ag distance is practically the same for every surface, while the adsorption energy depends on the surface structure: 0.32, 0.40, and 0.49 eV per molecule for (111), (001), and (110), respectively. Additionally, the electronic structure and binding energies of NH_3Ag_n (n=1,2) complexes have been calculated to investigate to what extent the formation of the weak N-Ag chemical bond might be determined mainly by local interactions. The bonding mechanism is explained as resulting from the combined effects of covalent and polarization contributions.
机译:从头算密度函数理论已被用来研究NH_3分子在Ag(111),(001)和(110)表面上的吸附。使用全电子全势线性化增强平面波方法计算出优选的吸附位点,吸附能和表面结构的弛豫。我们发现NH_3优先在与C_3轴垂直于表面的顶部位置结合。在这个位置,每个表面的N-Ag距离实际上是相同的,而吸附能量取决于表面结构:(111),(001)和(110)的分子每分子0.32、0.40和0.49 eV,分别。此外,已计算出NH_3Ag_n(n = 1,2)配合物的电子结构和结合能,以研究弱N-Ag化学键形成的程度可能主要由局部相互作用决定。结合机理被解释为是由于共价和极化贡献的共同作用而产生的。

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