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首页> 外文期刊>Physical review >Relaxation Models Of The (110) Zinc-blende Iii-v Semiconductor Surfaces:density Functional Study
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Relaxation Models Of The (110) Zinc-blende Iii-v Semiconductor Surfaces:density Functional Study

机译:(110)闪锌矿II-v半导体表面的弛豫模型:密度泛函研究

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摘要

Clean III-V zinc-blende (110) surfaces are the most extensively studied semiconductor surface. For conventional III-V compounds such as GaAs and InP, the surface relaxation follows a bond rotation relaxation model. However, for III-nitrides recent study indicates that they follow a bond-constricting relaxation model. First-principles atom relaxation calculations are performed to explore the origin of the difference between the two groups of materials. By analyzing the individual shift trends and ionic properties of the top layer anions and cations, we attribute the difference between the conventional and nitride III-V compounds to the strong electronegativity of N, which leads to the s2~p~3 pyramid bond angle to be larger than the ideal one in bulk (109.5°). The general trends of the atomic relaxation at the III-nitrides (110) surfaces are explained.
机译:清洁的III-V闪锌合(110)表面是研究最广泛的半导体表面。对于常规的III-V化合物(例如GaAs和InP),表面弛豫遵循键旋转弛豫模型。然而,对于III族氮化物,最近的研究表明它们遵循键约束弛豫模型。进行第一性原理原子弛豫计算以探究两组材料之间差异的起源。通过分析顶层阴离子和阳离子的单个迁移趋势和离子性质,我们将常规化合物和氮化物III-V化合物之间的差异归因于N的强电负性,从而导致s2〜p〜3金字塔键角为大于理想的整体体积(109.5°)。解释了III族氮化物(110)表面原子弛豫的一般趋势。

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