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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >STM observation and first-principles determination of Ge nanoscale structures on Si(111)
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STM observation and first-principles determination of Ge nanoscale structures on Si(111)

机译:Si(111)上Ge纳米结构的STM观察和第一性原理确定

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摘要

Scanning tunneling microscopy observations and first-principles quantum mechanical calculations were employed to investigate the nanoscale structures formed on Si(111) surfaces upon germanium deposition at a coverage of ~ 0.3 monolayer. At room temperature, Ge atoms form nanoclusters with sizes of 1.5-6 nanometers in width. After annealing, the nanoclusters become two-dimensional islands with typical size of ~10 nanometers in width. We propose that the annealing or high-T deposition results in a partial transformation of (7 X 7) reconstructed unit cells to unreconstructed Si(111) configurations on which the Ge adatoms reside at the T_4 sites and form a (3~(1/2) X 3~(1/2))R30° reconstruction.
机译:扫描隧道显微镜观察和第一性原理量子力学计算被用来研究锗沉积在Si(111)表面上形成的纳米级结构,覆盖率约为0.3单层。在室温下,Ge原子形成宽度为1.5-6纳米的纳米团簇。退火后,纳米簇变成二维岛,典型尺寸为约10纳米宽。我们认为,退火或高T沉积会导致(7 X 7)重建的晶胞部分转化为未重建的Si(111)构型,Ge原子位于T_4位置并形成(3〜(1 / 2)X 3〜(1/2))R30°重建

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