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Location of hydrogen adsorbed on Rh(111) studied by low-energy electron diffraction and nuclear reaction analysis

机译：低能电子衍射和核反应分析研究Rh（111）上氢的吸附位置

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The structures of clean and hydrogen-adsorbed Rh(111) surfaces were investigated by dynamical low-energy electron-diffraction (LEED) analysis. Exposure of D_2 induced no additional LEED patterns except for (1×1). Surface-layer relaxation occurs vertically on both clean and D-saturated surfaces. On the clean surface, the interlayer distance between the first and second layers (d_(12)) is smaller by 1.2(±0.6)% than the corresponding bulk distance of 2.194 A. On the other hand, the contraction of d_(12) is removed on the D-saturated surface. Detailed LEED analysis demonstrates that the D atoms are adsorbed on the fcc threefold hollow sites. The absolute saturation coverage of H on Rh(111) was determined to be 0.84 ML by nuclear reaction analysis (NRA). Moreover, the zero-point vibrational energy of H was derived from the analysis of the NRA resonance profile, which is discussed in comparison with the results of high-resolution electron-energy-loss spectroscopy.
机译：通过动态低能电子衍射（LEED）分析研究了干净的氢吸附Rh（111）表面的结构。 D_2的暴露除了（1×1）之外，没有引起其他LEED模式。表面层松弛在清洁和D饱和表面上都垂直发生。在干净的表面上，第一层和第二层之间的层间距离（d_（12））比相应的体积距离2.194 A小1.2（±0.6）％。另一方面，d_（12）的收缩在D饱和表面上被去除。详细的LEED分析表明D原子被吸附在fcc三重空心位点上。通过核反应分析（NRA）确定H在Rh（111）上的绝对饱和覆盖率为0.84 ML。此外，H的零点振动能是通过对NRA共振曲线的分析得出的，并与高分辨率电子能量损失谱的结果进行了比较。

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