Li-induced metal-semiconductor-metal transitions on the Si(111)-(7 x 7) surface: A work function, photoemission, and NMR study

C. Weindel; H. J. Jaensch; G. Kirchner; H. Kleine; J. J. Paggel; J. Roth; H. Winnefeld; D. Fick

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Li-induced metal-semiconductor-metal transitions on the Si(111)-(7 x 7) surface: A work function, photoemission, and NMR study

机译：Li诱导Si（111）-（7 x 7）表面上的金属-半导体-金属跃迁：功函数，光发射和NMR研究

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The metallic (7 x 7) reconstructed Si(111)-surface undergoes with increasing Li coverage a metal-semiconductor-metal transition as seen in work function changes, photoelectron spectra and T_1 times determined in NMR experiments. From zero coverage to about 0.12 ML the partly delocalized electron gas of the originally metallic Si(111)-(7 x 7) surface becomes increasingly localized. Around 1 ML Li coverage the surface becomes semiconducting and its properties may be understood in a simple local bonding picture in which the (sp)~3-Si orbitals hybridize with the 2s-Li orbital. A further increase of coverage leads to a metallic overlayer.

机译：金属（7 x 7）重建的Si（111）表面随着Li覆盖率的增加而经历金属-半导体-金属跃迁，这在功函数变化，光电子光谱和NMR实验中确定的T_1时间中可见。从零覆盖率到约0.12 ML，原始金属Si（111）-（7 x 7）表面的部分离域电子气变得越来越局部化。在大约1 ML Li的覆盖范围内，表面变成半导体，其性质可以通过简单的局部键合图来理解，其中（sp）〜3-Si轨道与2s-Li轨道杂化。覆盖率的进一步增加导致金属覆盖层。

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来源
《Physical review. B, Condensed Matter And Materals Physics》 |2005年第11期|p.115318.1-115318.7|共7页
作者
C. Weindel; H. J. Jaensch; G. Kirchner; H. Kleine; J. J. Paggel; J. Roth; H. Winnefeld; D. Fick;
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Philipps-Universitaet, Fachbereich Physik und Zentrum fuer Materialwissenschaften, D-35032 Marburg, Germany;

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正文语种 eng
中图分类固体物理学;
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relaxation effects; nuclear magnetic resonance and relaxation; semiconductor surfaces; phase transitions and critical phenomena;

机译：弛豫效应;核磁共振和弛豫;半导体表面;相变和临界现象;

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Li-induced metal-semiconductor-metal transitions on the Si(111)-(7 x 7) surface: A work function, photoemission, and NMR study

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