Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure

SHI Changyong; MA Zhibin

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Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure

机译：大气压脉冲电弧放电合成结晶碳氮化物薄膜

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The preparation of crystalline C3N4 films was investigated using pulsed arc discharge from mixed methanol and ammonia water at atmospheric pressure. The X-ray diffraction (XRD) patterns of the films prepared at a substrate temperature of 450℃ suggested that the film was composed of α-C_3N_4 and β-C_3N_4 crystallites. Raman spectra exhibited distinct peaks which are in good agreement with those predicted theoretically for C_3N_4 crystallites.

机译：使用大气压下混合甲醇和氨水的脉冲电弧放电研究了晶体C3N4薄膜的制备。在450℃的基底温度下制备的薄膜的X射线衍射图谱表明，该薄膜由α-C_3N_4和β-C_3N_4微晶组成。拉曼光谱显示出明显的峰，这些峰与理论上对C_3N_4晶体预测的峰一致。

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来源
《Plasma Science & Technology》 |2007年第4期|p.460-462|共3页
作者
SHI Changyong; MA Zhibin;
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作者单位

Basic Department, Beijing Institute of Clothing Technology, Beijing 100029, China;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种 eng
中图分类物理学;
关键词
carbon nitride; pulsed arc discharge; X-ray diffraction; raman spectrum;

机译：氮化碳;脉冲电弧放电;X射线衍射;拉曼光谱;

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专利

1. Synthesis of crystalline carbon nitride thin films by pulsed arc - Discharge at atmospheric pressure [J] . Shi CY, Ma ZB Plasma Science & Technology . 2007,第4期

机译：脉冲电弧合成结晶氮化碳薄膜-常压放电。
2. Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure [J] . SHI Changyong, MA Zhibin 等离子体科学和技术（英文版） . 2007,第004期

机译：常压脉冲电弧放电合成结晶碳氮化物薄膜
3. Preparation of carbon films from organic solutions by pulsed arc discharge at atmospheric pressure [J] . Zhibin Ma, Jun Wan, Yangfeng Huang, Thin Solid Films . 2003,第1a2期

机译：在大气压下通过脉冲电弧放电从有机溶液中制备碳膜
4. Crystalline Carbon Nitride Thin Films Deposition by DC Arc Source Evaporation with Pulsed Laser Ablation [C] . Kim, J.I., Kudryashov, . 2001

机译：直流电弧源蒸发和脉冲激光烧蚀沉积结晶氮化碳薄膜
5. Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge. [D] . Hu, Shunfu. 2008

机译：大气压等离子体CVD工艺的设计，该工艺使用介电势垒放电沉积氮化硅薄膜。
6. Atmospheric-Pressure Pulsed Discharge Plasma in aSlug Flow Reactor System for the Synthesis of Gold Nanoparticles [O] . Motoki Yamada, Wahyudiono, Siti Machmudah, 2020

机译：大气中的大气压脉冲放电等离子体弹状流反应器系统用于合成金纳米粒子
7. Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma [O] . 2003

机译：使用脉冲激光烧蚀结合高压放电等离子体形成介电碳氮化物薄膜的形成
8. High-pressure pulsed plasma synthesis of carbon-nitride thin films [R] . Gurarie, V. N. , Orlov, A. V. , Bursill, L. A. , 1996

机译：高压脉冲等离子体合成碳氮化物薄膜

Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure

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