• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Radiation Protection Dosimetry >ANALYSES OF ABSORBED DOSE TO TOOTH ENAMEL AGAINST EXTERNAL PHOTON EXPOSURE
【24h】

ANALYSES OF ABSORBED DOSE TO TOOTH ENAMEL AGAINST EXTERNAL PHOTON EXPOSURE

机译：外部光子暴露对牙釉质吸收剂量的分析

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Absorbed dose to tooth enamel was examined against external photon exposure by measurements with thermolumi-nescence dosemeters (TLDs) and Monte Carlo calculations. TLDs were placed in a realistic physical phantom to measure dose to the teeth region in a head. A voxel-type phantom was constructed from computed tomography (CT) images of the physical phantom. Monte Carlo calculations with this voxel-type phantom were performed to analyse the results of the experiments. The data obtained were compared to the enamel doses, which were calculated with a modified MIRD-type phantom and already given in a previous paper. It was confirmed that the data derived with the MIRD-type phantom are applicable for retrospective individual dose assessments by electron spin resonance (ESR) dosimetry using teeth for the photon energy region above 300 keV. The analysis, however, indicated that the configuration of the head can affect the enamel dose relative to external exposure to photons with energy below 100 keV.
机译：通过用热致发光剂量计（TLD）和蒙特卡洛计算测量，检查牙釉质的吸收剂量与外部光子暴露的关系。将TLD放置在逼真的物理模型中，以测量头部牙齿区域的剂量。从体模的计算机断层扫描（CT）图像构造体素型体模。使用该体素型体模进行了蒙特卡罗计算，以分析实验结果。将获得的数据与牙釉质剂量进行比较，牙釉质剂量是使用改良的MIRD型体模计算得出的，并且已在先前的论文中给出。已经证实，使用MIRD型体模导出的数据可适用于通过电子自旋共振（ESR）剂量测定法对牙齿进行300 keV以上光子能量区域的回顾性个体剂量评估。然而，分析表明，相对于外部暴露于能量低于100 keV的光子，头部的配置会影响搪瓷剂量。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号