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首页> 外文期刊>Reactive & Functional Polymers >Preparation of solvent resistant supports through formation of a semi- interpenetrating polysulfone/polyacrylate network using UV cross-linking - Part 2: Optimization of synthesis parameters for UV-LED curing
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Preparation of solvent resistant supports through formation of a semi- interpenetrating polysulfone/polyacrylate network using UV cross-linking - Part 2: Optimization of synthesis parameters for UV-LED curing

机译：使用UV交联的半渗透性聚砜/聚丙烯酸酯网络制备耐溶剂抗体 - 第2部分：UV-LED固化的合成参数优化

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摘要

Concerns of energy shortage and pollution, have rapidly increased the demand for efficient separation processes. In this respect, solvent resistant nanofiltration has become an emerging technology with great potential as an energy-efficient and waste-free separation method. Unfortunately, the lack of sufficient stability (especially chemical stability of the support) still restricts the utilization of this separation technique to the more mild industries, leaving several unexploited. As already detailed in part I of this research, one promising approach to increase the chemical stability of supports, used afterwards as starting point for the synthesis of thin film composite nanofiltration membranes, is cross-linking polymeric OF membranes by UV-irradiation. Whereas in the previous part, the 365 nm UV-LED light was selected as the best setup to achieve a high cross-linking efficiency at high throughputs, in this second part the impact of (non-)compositional parameters on the cross linking efficiency was investigated. The most important parameters with the largest impact on the degree of conversion (DC) were shown to be the cross-linker content, the membrane thickness and the incorporation of a non-woven support. Finally and more importantly, after curing the membranes did not only show enhanced solvent stabilities (viz. part I), they also exhibited greater physical strength while at the same time maintaining the retention at a similar level as the non-cured membrane clearly indicating their industrial importance.
机译：能源短缺和污染的担忧，迅速增加了有效分离过程的需求。在这方面，耐溶剂纳米过滤器已成为一种具有能节能和无浪费分离方法的潜力巨大的新兴技术。不幸的是，缺乏足够的稳定性（特别是支持的化学稳定性）仍然限制了这种分离技术的利用，以更温和的行业，留下几种未爆发的。如本研究的第I部分详述，提高支持的化学稳定性的有希望的方法，之后作为合成薄膜复合纳米过滤膜的起点，是通过UV辐射交联聚合物的膜的交联聚合物。虽然在上一部分中，选择了365nm紫外线LED灯作为在高吞吐量下实现高交联效率的最佳设置，但在第二部分中，（非）组成参数对交叉连接效率的影响是调查。具有最大对转化程度（DC）影响的最重要参数被显示为交联剂含量，膜厚度和掺入无纺布载体。最后，更重要的是，在固化膜后，膜不仅显示出增强的溶剂稳定性（viz。第I部分），它们也表现出更大的物理强度，同时保持与非固化膜相似的含量的相同水平的保留情况工业重要性。

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  • 来源
    《Reactive & Functional Polymers》 |2020年第1期|104403.1-104403.9|共9页
  • 作者

    Van den Mooter Peter-Renaat; Daems Nick; Vankelecom Ivo F. J.;

  • 作者单位

    Katholieke Univ Leuven Fac Biosci Engn cMACS Membrane Technol Grp Celestijnenlaan 200F Box 2454 B-3000 Heverlee Belgium;

    Univ Antwerp Appl Electrochem & Catalysis Campus Drie EikenUniv Pl 1 B-2610 Antwerp Belgium|Flemish Inst Technol Res VITO Separat & Convers Technol B-2400 Mol Belgium;

    Katholieke Univ Leuven Fac Biosci Engn cMACS Membrane Technol Grp Celestijnenlaan 200F Box 2454 B-3000 Heverlee Belgium;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Photo-irradiation; UV cross-linking; UV-LED; Solvent resistant support; Upscaling;

    机译：照片辐照;UV交联;UV-LED;耐溶剂耐受;升级;

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