Use of the Far Infrared Tangential Interferometer/Polarimeter diagnostic for the study of rf driven plasma waves on NSTX a

著录项

• 来源
  《Review of Scientific Instruments》 |2010年第10期|p.1-3|共3页
• 作者

  J. Kim; K. C. Lee; R. Kaita; C. K. Phillips; C. W. Domier; E. Valeo; N. C. Luhmann Jr.; P. T. Bonoli; H. Park;

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• 作者单位

  Department of Physics, POSTECH, Pohang, Gyeongbuk 790-784, Korea;

  University of California at Davis, Davis, California 95616, USA;

  Princeton Plasma Physics Laboratory, Princeton, New Jersey 08543, USA;

  Princeton Plasma Physics Laboratory, Princeton, New Jersey 08543, USA;

  University of California at Davis, Davis, California 95616, USA;

  Princeton Plasma Physics Laboratory, Princeton, New Jersey 08543, USA;

  University of California at Davis, Davis, California 95616, USA;

  Plasma Science and Fusion Center, MIT, Cambridge, Massachusetts, USA;

  Department of Physics, POSTECH, Pohang, Gyeongbuk 790-784, Korea;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  electron density; high-frequency discharges; light interferometry; plasma density; plasma diagnostics; plasma fluctuations; plasma waves; polarimetry;

  机译：电子密度;高频放电;光干涉法;等离子密度;等离子诊断;等离子涨落;等离子波;极化;