Ultraviolet stimulated electron source for use with low energy plasma instrument calibration

Henderson Kevin; Harper Ron; Funsten Herb; MacDonald Elizabeth

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Ultraviolet stimulated electron source for use with low energy plasma instrument calibration

机译：紫外线激发电子源，用于低能等离子体仪器校准

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We have developed and demonstrated a versatile, compact electron source that can produce a mono-energetic electron beam up to 50 mm in diameter from 0.1 to 30 keV with an energy spread of <10 eV. By illuminating a metal cathode plate with a single near ultraviolet light emitting diode, a spatially uniform electron beam with 15% variation over 1 cm2 can be generated. A uniform electric field in front of the cathode surface accelerates the electrons into a beam with an angular divergence of <1° at 1 keV. The beam intensity can be controlled from 10 to 109 electrons cm-2 s-1.

机译：我们已经开发并展示了一种多功能的紧凑型电子源，该电子源可以产生直径从0.1到30 keV的最大50 mm的单能电子束，其能量散布小于10 eV。通过用单个近紫外发光二极管照射金属阴极板，可以产生在1 cm 2 上具有15％变化的空间均匀的电子束。阴极表面前的均匀电场将电子加速成1keV时发散角小于1°的电子束。束强度可以控制在10到10 9 个电子cm -2 s -1 。

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《Review of Scientific Instruments》 |2012年第7期|p.1-6|共6页
作者
Henderson Kevin; Harper Ron; Funsten Herb; MacDonald Elizabeth;
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作者单位

Space Science and Applications, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA;

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7. Ultraviolet stimulated electron source for use with low energy plasma instrument calibration [O] . Henderson, Kevin, Harper, Ron, Funsten, Herb, 2012

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Ultraviolet stimulated electron source for use with low energy plasma instrument calibration

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