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Specifics of Processing Fine Silica Powder in a Jet of Low-Temperature Plasma

机译:在低温等离子体射流中加工细粉二氧化硅的详细信息

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摘要

Specifics of processing fine silica in a high-frequency induction plasmatron jet are described. The investigations were made in a 1000-kW semi-industrial HF induction plasmatron at an operating frequency of 440 kHz. General design principles of the installation comprising the HF induction plasmatron are described. The choice of material for treatment is validated. Parameters of the discharge chamber are given. Great attention is given to the adjustment characteristics of the material treatment process relating to introduction of powder into the treatment zone. The investigations yielded adjustment characteristics for optimizing the technological process.
机译:描述了在高频感应等离子加速器喷射中处理细二氧化硅的细节。研究是在工作频率为440 kHz的1000 kW半工业HF感应等离子加速器中进行的。描述了包括HF感应等离子体发生器的设备的一般设计原理。治疗材料的选择已得到验证。给出了排放室的参数。极大地关注了与将粉末引入处理区有关的材料处理过程的调节特性。研究得出了用于优化工艺流程的调整特性。

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