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Catalyst-referred etching of silicon

机译：催化剂对硅的蚀刻

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摘要

A Si wafer and polysilicon deposited on a Si wafer were planarized using catalyst-referred etching (CARE). Two apparatuses were produced for local etching and for planarization. The local etching apparatus was used to planarize polysilicon and the planarization apparatus was used to planarize Si wafers. Platinum and hydrofluoric acid were used as the catalytic plate and the source of reactive species, respectively. The processed surfaces were observed by optical interferometry, atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results indicate that the CARE-processed surface is flat and undamaged.
机译：使用催化剂参考蚀刻（CARE）将Si晶片和沉积在Si晶片上的多晶硅平坦化。生产了两种用于局部蚀刻和平面化的设备。使用局部蚀刻设备来平坦化多晶硅，并且使用平坦化设备来平坦化硅晶片。铂和氢氟酸分别用作催化板和反应物种的来源。通过光学干涉仪，原子力显微镜（AFM）和扫描电子显微镜（SEM）观察加工过的表面。结果表明，经过CARE处理的表面是平坦且未损坏的。

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