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首页> 外文期刊>Science and Technology of Advanced Materials >Nano/micro-patterning of anatase TiO_2 thin film from an aqueous solution by site-selective elimination method
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Nano/micro-patterning of anatase TiO_2 thin film from an aqueous solution by site-selective elimination method

机译：位置选择性消除方法从水溶液中制备锐钛矿型TiO_2薄膜的纳米/微图案

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摘要

We proposed a novel method to fabricate nano/micro-scaled patterns of thin films and successfully fabricated patterns of anatase TiO_2 thin films in an aqueous solution at 50℃. The patterned self-assembled monolayer (SAM) having octadecyltrichlorosilane (OTS) regions and silanol regions was immersed in a solution containing a Ti precursor and subjected to ultrasonication for several hours. The difference in adhesion of thin films on substrates was employed for the site-selective elimination method. Heterogeneously nucleated TiO_2 and homogeneously nucleated TiO_2 particles adhering to the OTS-SAM could be easily eliminated from the substrate by ultrasonication, whereas those on silanol groups maintained their adhesion during the immersion period. TiO_2 can form chemical bonds such as Ti-O-Si with silanol groups, but cannot form them with octadecyl groups, resulting in the difference in adhesion, which is the essence of the site-selectivity of this method. The site-selective elimination method can be applied to fabricate nano/micro-scaled patterns in the solution by the immersion of the substrate that has regions on which depositions adhere strongly and regions on which depositions adhere weakly, enabling elimination by treatment such as ultrasonication.
机译：我们提出了一种新颖的方法来制备薄膜的纳米/微米尺度的图案，并成功地在50℃的水溶液中制备了锐钛矿型TiO_2薄膜的图案。将具有十八烷基三氯硅烷（OTS）区域和硅烷醇区域的图案化的自组装单层（SAM）浸入包含Ti前体的溶液中，并进行超声处理数小时。位置选择性消除方法采用了薄膜在基材上的粘附力差异。通过超声处理可以很容易地从基底上去除粘附在OTS-SAM上的异核TiO_2和异核TiO_2颗粒，而在硅烷醇基上的那些则在浸没期间保持了它们的粘附性。 TiO_2可以与硅烷醇基形成化学键，如Ti-O-Si，但不能与十八烷基形成化学键，从而导致粘合力差异，这是该方法对位选择性的本质。可以通过将基板浸没在溶液中来制造溶液中的纳米/微米级图案，该部位选择性消除方法可用于在溶液中制造纳米/微米级图案，该基板具有沉积物附着力强的区域和沉积物附着力弱的区域，从而能够通过诸如超声处理的消除。

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