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首页> 外文期刊>Sensing and imaging >Effect of Oxygen Sputter Pressure on the Structural,Morphological and Optical Properties of ZnO Thin Films for Gas Sensing Application
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Effect of Oxygen Sputter Pressure on the Structural,Morphological and Optical Properties of ZnO Thin Films for Gas Sensing Application

机译：氧溅射压力对气敏ZnO薄膜结构，形貌和光学性能的影响

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摘要

ZnO thin films were prepared on glass substrates at low (5×10~(-4) mbar)rnand high (3×10~(-3) mbar) sputter pressure using dc reactive magnetron sputtering.rnThe structural, morphological, compositional and optical properties of the thin filmsrnwere investigated. XRD patterns of both films confirmed the polycrystalline naturernof the films with hexagonal Wurtzite structure. SEM study indicates that the surfacernof the film formed at high sputter pressure was more uniform, compact and porousrnin nature. From the EDAX analysis, no other characteristic peaks of other impuritiesrnwere observed and the formation of single phase of ZnO was confirmed. From thernstudy of photoluminescence, three peaks were observed, one strong near band-edgernemission at 390 nm followed by weak and broad visible emissions aroundrn420–480 nm. Room temperature ammonia sensing characteristics of ZnO nanothinrnfilms formed at higher sputter pressure were studied for different ammonia vapourrnconcentration levels. The response of the Ammonia sensor at room temperaturern(30 ℃) operation was observed to be of high sensitivity with quick response andrnrecovery times.
机译：使用直流反应磁控溅射在低（5×10〜（-4）mbar）和高（3×10〜（-3）mbar）溅射压力下在玻璃基板上制备ZnO薄膜。结构，形态，组成和光学性质研究了薄膜的性能。两种膜的XRD图谱证实了具有六角纤锌矿结构的膜具有多晶性质。 SEM研究表明，在高溅射压力下形成的薄膜表面更均匀，致密且具有多孔性。通过EDAX分析，未观察到其他杂质的其他特征峰，并且确认了ZnO单相的形成。从光致发光的研究中，观察到三个峰，其中一个在390 nm处出现了很强的近能带发射，随后在420-480 nm处出现了弱而宽的可见光。研究了在不同的氨气浓度水平下，在较高的溅射压力下形成的ZnO纳米薄膜的室温氨感测特性。氨传感器在室温（30℃）下的响应具有很高的灵敏度，响应速度快，恢复时间短。

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  • 来源
    《Sensing and imaging》 |2018年第1期|1.1-1.18|共18页
  • 作者

    S. Fairose; Suhashini Ernest; Samson Daniel;

  • 作者单位

    PG & Research Department of Physics, Urumu Dhanalakshmi College, Trichy,Tamil Nadu 620 019, India;

    PG & Research Department of Physics, Urumu Dhanalakshmi College, Trichy,Tamil Nadu 620 019, India;

    PG & Research Department of Physics, Bharathidasan University, Trichy, Tamil Nadu 620 024,India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ammonia; Chemiresistor; Sputtering; Sensitivity;

    机译：氨;化学反应器溅射;灵敏度;

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