• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Sensors and materials >Characterization of Photoconductive Diamond Detectors - Candidate Vacuum Ultraviolet Radiation and Extreme Ultraviolet Radiation Light Source Detectors for Lithography
【24h】

Characterization of Photoconductive Diamond Detectors - Candidate Vacuum Ultraviolet Radiation and Extreme Ultraviolet Radiation Light Source Detectors for Lithography

机译：光电导金刚石探测器的特性-光刻用候选真空紫外辐射和极紫外辐射光源探测器

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The characteristics of an ultraviolet (UV) and vacuum ultraviolet (VUV) radiation photodetector with a photoconductive highly oriented diamond (HOD) film were evaluated using continuous light sources (a low-pressure mercury lamp and a xenon excimer lamp) that mainly emit light in the UV range. It was confirmed that the change in the spectral responsivity of the photodetector is extremely limited upon continuous UV radiation. In this report, the results of the evaluation of the characteristics of the UV photodetector with a photoconductive diamond film (hereafter, diamond UV photodetector) using continuous light sources are reported. We also found that the diamond UV photodetector has characteristics enabling its use as a photodetector for ArF excimer lasers and extreme ultraviolet (EUV) light sources, as a result of the evaluation using a light source employed in lithography. The results are also described. The evaluation of the diamond UV photodetector using an ArF excimer laser revealed that it can detect a laser with a pulse width of 5 ns. Also, good linearity between the pulse energy and the output was observed for pulse energies of 1-100 μ/cm~2. By the measurement of the spectral responsivity to synchrotron radiation, the diamond UV photodetector was found to have high spectral responsivity in the wavelength range of 10-33 nm. According to the results given above, the diamond UV photodetector has sufficient time responsiveness (follow-up performance) to enable the measurement of ArF excimer lasers and sufficient spectral responsivity to detect light in the EUV region, suggesting its use as a photodetector of light sources used in lithography.
机译：使用连续发光的光源（低压汞灯和氙准分子灯）评估带有光电导性高取向金刚石（HOD）膜的紫外（UV）和真空紫外（VUV）辐射光电探测器的特性。紫外线范围。已经证实，在连续的紫外线辐射下，光检测器的光谱响应度的变化受到极大限制。在该报告中，报道了使用连续光源的具有光电导金刚石膜的紫外光电检测器（以下称为金刚石紫外光电检测器）的特性评估结果。我们还发现，通过使用光刻中使用的光源进行评估，金刚石UV光电探测器具有使其能够用作ArF准分子激光器和极紫外（EUV）光源的光电探测器的特性。还描述了结果。使用ArF准分子激光器对钻石紫外光电探测器的评估表明，它可以探测到脉冲宽度为5 ns的激光器。此外，对于1-100μ/ cm〜2的脉冲能量，在脉冲能量和输出之间观察到良好的线性。通过测量对同步加速器辐射的光谱响应度，发现金刚石紫外光电探测器在10-33 nm的波长范围内具有较高的光谱响应度。根据上面给出的结果，钻石紫外光电探测器具有足够的时间响应能力（跟踪性能）以能够测量ArF准分子激光器，并且具有足够的光谱响应能力来检测EUV区域中的光，这表明它可以用作光源的光电探测器用于光刻。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号